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Title:
CYCLIC HEMIACETAL COMPOUND PRODUCTION METHOD
Document Type and Number:
WIPO Patent Application WO/2016/047428
Kind Code:
A1
Abstract:
[Problem] To provide a cyclic hemiacetal compound production method that is performed under mild conditions easily and at a high yield and that is superior in stereoselectivity and enables mass production. [Solution] Provided is a production method for a compound represented by general formula (II), wherein a compound represented by general formula (I) is reacted under acidic conditions. General formula (I) General formula (II) L represents a halogen atom or -OSO2Ra, and RN represents -Rb, -ORb, or -N(Rb)(Rc). Ra represents a halogen atom, an aliphatic group, an aryl group, or a heterocyclic group, and Rb and Rc represent a hydrogen atom, an aliphatic group, an acyl group, an aryl group, or a heterocyclic group. R1 represents a hydrogen atom, an aliphatic group, an aryl group, or a heterocyclic group, X represents a single bond or -C(RXA)(RXB)-, and R2A to R4A, R2B to R4B, RXA, and RXB represent a hydrogen atom or a substituent. R2A and R2B, R3A and R3B, or RXA and RXB, in conjunction with each other, may form =O or a methylidene group represented by =C(Rd)(Re), or at least two of R2A to R4A, R2B to R4B, RXA, and RXB may be bonded to each other to form a ring. Rd and Re represent a hydrogen atom or a substituent.

Inventors:
TAKEDA, Akira (577 Ushijima, Kaisei-machi, Ashigarakami-gu, Kanagawa 77, 〒2588577, JP)
WATANABE, Toru (577 Ushijima, Kaisei-machi, Ashigarakami-gu, Kanagawa 77, 〒2588577, JP)
ITO, Takayuki (577 Ushijima, Kaisei-machi, Ashigarakami-gu, Kanagawa 77, 〒2588577, JP)
Application Number:
JP2015/075336
Publication Date:
March 31, 2016
Filing Date:
September 07, 2015
Export Citation:
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Assignee:
FUJIFILM CORPORATION (26-30, Nishiazabu 2-chome Minato-k, Tokyo 20, 〒1068620, JP)
International Classes:
C07H13/08; C07H15/203; C07B61/00
Domestic Patent References:
WO2014027658A12014-02-20
Foreign References:
CN101058557A2007-10-24
US20140113325A12014-04-24
Attorney, Agent or Firm:
IIDA, Toshizo et al. (ISHII Bldg. 3F, 1-10 Shimbashi 3-chome, Minato-k, Tokyo 04, 〒1050004, JP)
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