Title:
CYLINDRICAL MAGNETIC LEVITATION STAGE AND LITHOGRAPHY
Document Type and Number:
WIPO Patent Application WO/2011/074775
Kind Code:
A2
Abstract:
The present invention provides a cylindrical magnetic levitation stage and an exposure apparatus, which can form a nanoscale pattern of a large area directly on the surface of a large cylinder. The present invention provides an exposure apparatus including a new type of cylindrical magnetic levitation stage, which can levitate, rotate, and move a cylinder in the axial direction by the principle of magnetic levitation in a non-contact manner and form a nanoscale pattern on the surface of the cylinder, and a light source for irradiating light on the surface of the cylinder, thereby reducing the position error of the cylindrical magnetic levitation stage to a nanoscale size and correcting the error caused by mechanical processing in real time. Moreover, the present invention provides an exposure apparatus, which includes a differential vacuum means combined with the cylindrical magnetic levitation stage to create a partial vacuum environment between the light source and the surface of the cylinder, and thus it is possible to employ light sources such as X-rays, electron beams, extreme ultraviolet (EUV) rays, etc.
Inventors:
JEON JEONG WOO (KR)
OH HYUN SEOK (KR)
CARAIANI MITICA (KR)
CHUNG SUNG IL (KR)
KIM HYEON TAEG (KR)
LEE CHANG RIN (KR)
KIM JONG MOON (KR)
OH HYUN SEOK (KR)
CARAIANI MITICA (KR)
CHUNG SUNG IL (KR)
KIM HYEON TAEG (KR)
LEE CHANG RIN (KR)
KIM JONG MOON (KR)
Application Number:
PCT/KR2010/007464
Publication Date:
June 23, 2011
Filing Date:
October 28, 2010
Export Citation:
Assignee:
KOREA ELECTRO TECH RES INST (KR)
JEON JEONG WOO (KR)
OH HYUN SEOK (KR)
CARAIANI MITICA (KR)
CHUNG SUNG IL (KR)
KIM HYEON TAEG (KR)
LEE CHANG RIN (KR)
KIM JONG MOON (KR)
JEON JEONG WOO (KR)
OH HYUN SEOK (KR)
CARAIANI MITICA (KR)
CHUNG SUNG IL (KR)
KIM HYEON TAEG (KR)
LEE CHANG RIN (KR)
KIM JONG MOON (KR)
International Classes:
H01L21/68; G03F7/20; H01L21/027
Foreign References:
| KR20080049386A | 2008-06-04 | |||
| JPS63177978A | 1988-07-22 | |||
| US20020088940A1 | 2002-07-11 | |||
| JP2002374664A | 2002-12-26 | |||
| JP2007109810A | 2007-04-26 |
Other References:
See references of EP 2513961A4
Attorney, Agent or Firm:
HALLA PATENT & LAW FIRM (KAMCO Yangjae Tower949-3 Dogok-dong,Gangnam-gu, Seoul 135-270, KR)
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