Title:
CYLINDRICAL PHOTOSENSITIVE RESIN STRUCTURE AND METHOD OF PREPARING CYLINDRICAL PRINTING PLATE
Document Type and Number:
WIPO Patent Application WO/1987/001213
Kind Code:
A1
Abstract:
A photosensitive resin solution is supplied into a cylinder which is rotated at a high speed, so that the photosensitive resin solution is uniformly adhered onto the inner surface of the cylinder due to centrifugal force and is solidified. Thus, there is obtained a cylindrical photosensitive resin structure without any seam. After a layer of the photosensitive resin solution is formed on the inner surface of the cylinder due to centrifugal force, back exposure is effected from the inside and relief exposure is also effected from the outside via an image carrier. This method makes it possible to prepare a resin printing plate and particularly a resin plate for flexo graphic printing, enabling seamless patterns to be printed.
Inventors:
KITAMURA ATSUSHI (JP)
YOSHIMOTO MAYUMI (JP)
YOSHIMOTO MAYUMI (JP)
Application Number:
PCT/JP1986/000435
Publication Date:
February 26, 1987
Filing Date:
August 23, 1986
Export Citation:
Assignee:
KITAMURA ATSUSHI (JP)
International Classes:
B29C41/04; G03C1/74; G03C5/08; G03F7/16; G03F7/18; G03F7/24; (IPC1-7): G03C1/74; B29C41/04; G03C5/08; G03F7/16; G03F7/24
Foreign References:
| JPH0580366A | 1993-04-02 | |||
| JPS49116168A | 1974-11-06 | |||
| JPS54121805A | 1979-09-21 |
Other References:
See also references of EP 0237574A4
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