Title:
CYLINDRICAL SPUTTERING TARGET AND MANUFACTURING METHOD THEREFOR
Document Type and Number:
WIPO Patent Application WO/2014/013925
Kind Code:
A1
Abstract:
The present invention readily and reliably joins a cylindrical target material and a backing tube, prevents damage to the cylindrical sputtering target, and improves the utilization ratio. One end part of the backing tube (40) is closed off by a dummy plug (60) to form a sealed end part (42). A molten joining material (30) is retained in a recessed joining-material-holding part (72) that is substantially circular in cross section and into which a backing tube provided to a joining-material-filling jig (70) can be inserted. The backing tube (40) with the sealed end part (42) facing downward is inserted with an interposing gap (g) into the interior of a target material (20) mounted on the joining-material-filling jig (70), and is inserted through the target material (20) into the joining-material-holding part (72), whereby the molten joining material (30) is pressed from the joining-material-holding part (72) and filled into the gap (g) between the internal peripheral surface of the target material (20) and the external peripheral surface of the backing tube (40). The joining material (20) is thereafter allowed to solidify and is taken away from the joining-material-filling jig (70), and the dummy plug (60) is removed.
Inventors:
YOSUKE MASANORI (JP)
Application Number:
PCT/JP2013/068933
Publication Date:
January 23, 2014
Filing Date:
July 11, 2013
Export Citation:
Assignee:
MITSUBISHI MATERIALS CORP (JP)
International Classes:
C23C14/34
Foreign References:
| JP2011252237A | 2011-12-15 | |||
| JPS62167041A | 1987-07-23 | |||
| JPH0860351A | 1996-03-05 |
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