DISPERSION CONTAINING HOLLOW SiO2, COATING COMPOSITION, AND SUBSTRATE WITH ANTIREFLECTION COATING FILM

Title:

DISPERSION CONTAINING HOLLOW SiO2, COATING COMPOSITION, AND SUBSTRATE WITH ANTIREFLECTION COATING FILM

Document Type and Number:

WIPO Patent Application WO/2006/129411

Kind Code:

A1

Abstract:

A hollow-SiO₂ dispersion which, when used to prepare a coating composition, forms a low-refractive-index coating film having refractive-index gradient. From the coating composition, an antireflection film can be obtained which has high antireflection performance and low chroma. The dispersion comprises a dispersion medium and, dispersed therein, aggregate particles which are aggregates each composed of primary fine hollow particles of SiO₂. The dispersion of fine silica particles has an average particle diameter of 60-400 nm, which is at least 1.5 times the average primary-particle diameter of the silica. When the dispersion is used to prepare a coating composition, the matrix ingredient preferably comprises a precursor for a metal oxide or an organic resin. Applying the coating composition to a substrate gives a substrate with an antireflection coating film.

Inventors:

KAWAI YOHEI (JP)
YONEDA TAKASHIGE (JP)

Application Number:

PCT/JP2006/305597

Publication Date:

December 07, 2006

Filing Date:

March 20, 2006

Export Citation:

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Assignee:

ASAHI GLASS CO LTD (JP)
KAWAI YOHEI (JP)
YONEDA TAKASHIGE (JP)

International Classes:

C09D17/00; B05D5/06; B05D7/24; B32B7/02; B32B27/20; B82Y10/00; B82Y20/00; B82Y30/00; B82Y40/00; C01B33/18; C08J7/046; C08J7/054; C09D5/00; C09D7/61; C09D201/00; G02B1/11; G02B1/111; G02B1/14

Foreign References:

JP2001233611A	2001-08-28
JP2002160907A	2002-06-04
JP2003133267A	2003-05-09

Other References: