Title:
DATA ANALYSIS DEVICE, SEMICONDUCTOR MANUFACTURING SYSTEM, DATA ANALYSIS METHOD, AND SEMICONDUCTOR MANUFACTURING METHOD
Document Type and Number:
WIPO Patent Application WO/2019/043780
Kind Code:
A1
Abstract:
The data analysis device according to the present invention is provided with: a data collection unit which, from each of a plurality of devices including a light source device, an exposure device for exposing a wafer with pulsed light outputted from the light source device, and a wafer inspection device for performing inspection on the wafer exposed by the exposure device, acquires data of individual parameters of objects to be analyzed in the respective devices; an image generation unit which forms images by visualizing, in each area predetermined within the wafer, the respective data of the plurality of parameters collected from the plurality of devices by the data collection unit, and then generates a plurality of mapped images for the respective parameters of the plurality of devices; and a correlation calculation unit which, with respect to the wafer, carries out pattern matching between a given pair of mapped images picked out of a plurality of mapped images so as to determine a correlation value between a given pair of parameters among the plurality of parameters of the plurality of devices.
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Inventors:
IGARASHI YUTAKA (JP)
MINEGISHI YUJI (JP)
WAKABAYASHI OSAMU (JP)
MINEGISHI YUJI (JP)
WAKABAYASHI OSAMU (JP)
Application Number:
PCT/JP2017/030907
Publication Date:
March 07, 2019
Filing Date:
August 29, 2017
Export Citation:
Assignee:
GIGAPHOTON INC (JP)
International Classes:
G03F7/20; H01L21/027
Foreign References:
| JP2017505460A | 2017-02-16 | |||
| JP2006203123A | 2006-08-03 | |||
| JP2006237052A | 2006-09-07 |
Attorney, Agent or Firm:
HOSAKA, Nobuhisa (JP)
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