Title:
DEFECT INSPECTION DEVICE AND DEFECT INSPECTION METHOD
Document Type and Number:
WIPO Patent Application WO/2021/029025
Kind Code:
A1
Abstract:
This defect inspection device comprises: an illumination optical system for emitting an illumination spot onto a sample; a detection unit for detecting, from multiple directions, reflected light from the sample that the illumination optical system has emitted the illumination spot onto; a control unit for controlling the scanning of the sample with the illumination spot from the illumination optical system such that when the sample is scanned by the illumination spot from the illumination optical system, parts of each detection area detected by the detection unit for detecting reflected light from multiple directions overlap; and a signal processing unit for detecting a defect by processing signals obtained by detecting the reflected light from the sample using the detection unit. The signal processing unit comprises a data integration unit for synthesizing integrated signals by processing the signals obtained by using the detection unit to detect, multiple times and in an overlapping manner, the reflected light from the sample at each detection area and a defect detection unit for detecting a defect on the surface of the sample on the basis of the integrated signals synthesized by the data integration unit.
Inventors:
HONDA TOSHIFUMI (JP)
MATSUMOTO SHUNICHI (JP)
OBARA NOBUHIRO (JP)
MATSUMOTO SHUNICHI (JP)
OBARA NOBUHIRO (JP)
Application Number:
PCT/JP2019/031918
Publication Date:
February 18, 2021
Filing Date:
August 14, 2019
Export Citation:
Assignee:
HITACHI HIGH TECH CORP (JP)
International Classes:
G01N21/956
Domestic Patent References:
| WO2018216277A1 | 2018-11-29 |
Foreign References:
| JP2011158260A | 2011-08-18 | |||
| JP2012137350A | 2012-07-19 | |||
| JP2015028457A | 2015-02-12 | |||
| US20140270471A1 | 2014-09-18 |
Attorney, Agent or Firm:
POLAIRE I.P.C. (JP)
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