Title:
DEFECT INSPECTION DEVICE
Document Type and Number:
WIPO Patent Application WO/2022/219667
Kind Code:
A1
Abstract:
The present invention relates to a defect inspection device that captures a mirror electron image. First, an objective lens parameter value that gives a predetermined defocus amount is determined from a plurality of mirror electron images acquired while changing the objective lens parameter value of an objective lens 23 in a first FOV. A first FOV image that is the mirror electron image for the first FOV is acquired by setting the determined objective lens parameter value for the objective lens and setting, for the imaging lens 22, the imaging lens parameter value determined on the basis of the correspondence information. Here, the correspondence information indicates the value of the imaging lens parameter that does not change the magnification of the mirror electron image acquired by the imaging optical system, regardless of the value of the objective lens parameter.
Inventors:
OGATA TOMOHIKO (JP)
HASEGAWA MASAKI (JP)
KANEOKA NORIYUKI (JP)
OHIRA KENTARO (JP)
MURAKOSHI HISAYA (JP)
HASEGAWA MASAKI (JP)
KANEOKA NORIYUKI (JP)
OHIRA KENTARO (JP)
MURAKOSHI HISAYA (JP)
Application Number:
PCT/JP2021/015120
Publication Date:
October 20, 2022
Filing Date:
April 12, 2021
Export Citation:
Assignee:
HITACHI HIGH TECH CORP (JP)
International Classes:
H01J37/28; G01N23/203; G01N23/2251
Domestic Patent References:
| WO2019058441A1 | 2019-03-28 | |||
| WO2017158742A1 | 2017-09-21 | |||
| WO2016002003A1 | 2016-01-07 |
Foreign References:
| JP2019169406A | 2019-10-03 |
Attorney, Agent or Firm:
POLAIRE I.P.C. (JP)
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