Title:
DEFECT INSPECTION METHOD, AND DEFECT INSPECTION DEVICE
Document Type and Number:
WIPO Patent Application WO/2010/024067
Kind Code:
A1
Abstract:
Provided are a defect inspection device and a defect inspecting method, which enlarge the uptake range of a light scattered from a fine defect thereby to heighten signal intensity.
The defect inspection device is provided with: a stage unit (300) capable of mounting an inspection object substrate (1) thereon to move same relative to an optical device; an illuminating optical device (100) for illuminating an inspection zone (4) on the inspection object substrate (1); a detecting optical device (200) for detecting a light from the inspection zone (4) of the inspection object substrate (1); an image sensor (205) for converting the image focused by the detecting optical device (200) into signals; a signal processing unit (402) for processing the signals from the image sensor (205) thereby to detect a defect; and a plane reflecting mirror (501) arranged between detecting optical device (200) and the inspection object substrate (1) and transmitting the light from the inspection object substrate (1) to the detecting optical device (200).
Inventors:
CHIKAMATSU SHUICHI (JP)
NOGUCHI MINORI (JP)
OCHI MASAYUKI (JP)
AIKO KENJI (JP)
NOGUCHI MINORI (JP)
OCHI MASAYUKI (JP)
AIKO KENJI (JP)
Application Number:
PCT/JP2009/063140
Publication Date:
March 04, 2010
Filing Date:
July 15, 2009
Export Citation:
Assignee:
HITACHI HIGH TECH CORP (JP)
CHIKAMATSU SHUICHI (JP)
NOGUCHI MINORI (JP)
OCHI MASAYUKI (JP)
AIKO KENJI (JP)
CHIKAMATSU SHUICHI (JP)
NOGUCHI MINORI (JP)
OCHI MASAYUKI (JP)
AIKO KENJI (JP)
International Classes:
G01N21/956; G01B11/30; H01L21/66
Foreign References:
| JP2007526444A | 2007-09-13 | |||
| JP2006300775A | 2006-11-02 | |||
| JP2008180601A | 2008-08-07 |
Attorney, Agent or Firm:
INOUE Manabu (6-1, Marunouchi 1-chome, Chiyoda-k, TOKYO 20, JP)
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