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Patent Searching and Data


Title:
DEFECT OBSERVATION DEVICE AND DEFECT OBSERVATION METHOD
Document Type and Number:
WIPO Patent Application WO/2018/167965
Kind Code:
A1
Abstract:
A defect observation device comprising: a defect determination coordinate creation unit by which the coordinates of a plurality of second defect candidates are determined as overlapping defect candidate coordinates, the plurality of second defect candidates respectively having, in a plurality of second imaging visual field regions overlapping a first imaging visual field region, a circuit pattern which partly overlaps a circuit pattern in the first imaging visual field region, in which a first defect candidate for defect determination among a plurality of defect candidates of a sample is present; a pseudo-reference image generation unit which generates a pseudo-reference image including a circuit pattern of the first defect candidate by superimposing a plurality of images respectively captured at the plurality of overlapping defect candidate coordinates; and a defect determination unit which compares an image for defect determination captured at the coordinates of the first defect candidate with the pseudo-reference image to determine the presence or absence of a defect in the image for defect determination.

Inventors:
KONDO NAOAKI (JP)
HARADA MINORU (JP)
TAKAGI YUJI (JP)
HIRAI TAKEHIRO (JP)
Application Number:
PCT/JP2017/011018
Publication Date:
September 20, 2018
Filing Date:
March 17, 2017
Export Citation:
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Assignee:
HITACHI HIGH TECH CORP (JP)
International Classes:
H01L21/66
Foreign References:
JP2007040910A2007-02-15
JP2011192766A2011-09-29
Attorney, Agent or Firm:
SEIRYO I.P.C. (JP)
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