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Title:
DENITRATION DEVICE
Document Type and Number:
WIPO Patent Application WO/2020/153304
Kind Code:
A1
Abstract:
A denitration device that has: an inlet duct having a flowpath that causes exhaust gas from a boiler to flow in the horizontal direction; a connecting duct having a flowpath that changes the flow of exhaust gas from the horizontal direction to the vertical direction; and a reactor duct having a flowpath that causes the exhaust gas to flow in the vertical direction. The reactor duct has therein, in order along the exhaust gas flow, a screen plate, a denitriding agent supply line system, and a fixed bed including a denitriding catalyst. The denitriding agent supply line system has: a heat exchange line for heating the denitriding agent using the heat held by the exhaust gas; a transportation line for supplying the denitriding agent heated by the heat exchange line to a nozzle; and the nozzle, for injecting the denitriding agent supplied via the transportation line to the reactor duct.

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Inventors:
TSUTSUMI RYUJI (JP)
MIYANISHI HIDEO (JP)
ODA MANABU (JP)
TODAKA SHIMPEI (JP)
Application Number:
PCT/JP2020/001739
Publication Date:
July 30, 2020
Filing Date:
January 20, 2020
Export Citation:
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Assignee:
MITSUBISHI HITACHI POWER SYS (JP)
International Classes:
B01D53/86; B01D53/90; F23J15/00
Domestic Patent References:
WO2007116602A12007-10-18
Foreign References:
JPH1057770A1998-03-03
JPS6012120A1985-01-22
JPS5610322A1981-02-02
JPH057731A1993-01-19
JP2000061283A2000-02-29
Attorney, Agent or Firm:
KIKUMA Tadayuki (JP)
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