DENITRATION DEVICE

WIPO Patent Application WO/2023/228495

A1

This denitration device (10) is provided with: an ammonia injection unit (11) for injecting ammonia into an exhaust gas flowing through a duct (3); a mixer (12) which is provided on the downstream side of the ammonia injection unit (11) and mixes the exhaust gas with ammonia; and a denitration catalyst (13) which is provide on the downstream side of the mixer (12), applies resistance to the flow of a mixed fluid that is a mixture of the exhaust gas and ammonia, and is provided over the entire area of a flow path cross-sectional surface of the duct (3). The ammonia injection unit (11) has an ammonia piping (11a) and an injection nozzle (11b) provided in the ammonia piping (11a) and capable of injecting ammonia into the duct (3). The distance A between the ammonia injection unit (11) and the mixer (12) is 10 times to 30 times inclusive larger than the outer diameter d of the ammonia piping (11a). The distance B between the mixer (12) and the denitration catalyst (13) is longer than the distance A between the ammonia injection unit (11) and the mixer (12).

TODAKA SHIMPEI (JP)
KAKO HIROSHI (JP)

PCT/JP2023/006075

November 30, 2023

February 20, 2023

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MITSUBISHI HEAVY IND LTD (JP)
MITSUBISHI POWER LTD (JP)

B01D53/86; B01D53/90; B01J21/06; F01N3/02; F01N3/08

WO2010032604A1

2010-03-25

JP2009108726A	2009-05-21
JP2016203032A	2016-12-08
JPS58143826A	1983-08-26
JPH10165769A	1998-06-23
JP2013180227A	2013-09-12

FUJITA, Takaharu (JP)

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