Title:
DENTAL IMPLANT CONTAINING POLYETHER-ETHER-KETONE INTERLAYER AND MANUFACTURING METHOD THEREFOR
Document Type and Number:
WIPO Patent Application WO/2019/218582
Kind Code:
A1
Abstract:
A dental implant containing a polyether-ether-ketone interlayer (3) and a manufacturing method therefor. The dental implant comprises an outer pile (1), an inner pile (2), and a polyether-ether-ketone interlayer (3). The outer pile (1) and the inner pile (2) are both standard revolving bodies. A blind hole (4) is formed in the outer pile (1). The inner pile (2) comprises a cylindrical table (5) and a connection rod (6) perpendicular to the end face of the cylindrical table (5). The polyether-ether-ketone interlayer (3) is fixedly provided in the blind hole (4) and provided with an internal thread matching the connection rod (6). The inner pile (2) is threadedly connected to the polyether-ether-ketone interlayer (3) by means of the connection rod (6). The dental implant containing the polyether-ether-ketone interlayer (3) reduces the overall elasticity modulus of the dental implant by adding the polyether-ether-ketone interlayer (3). The damaged dental implant can be conveniently dismantled and replaced by means of multi-layer structural design, and damage is reduced as well, especially when a central screw is always out of work. Moreover, the multi-layer structural design is beneficial for reuse of intact parts. The corresponding manufacturing method is easy and simple to operate, and the product cost is reduced.
Inventors:
ZHANG CHUNYU (CN)
JI FANGQIU (CN)
CHEN XIANSHUAI (CN)
JI FANGQIU (CN)
CHEN XIANSHUAI (CN)
Application Number:
PCT/CN2018/110013
Publication Date:
November 21, 2019
Filing Date:
October 12, 2018
Export Citation:
Assignee:
FOSHAN ANGELS BIOTECHNOLOGY CO LTD (CN)
International Classes:
A61C8/00
Foreign References:
| CN108542523A | 2018-09-18 | |||
| CN105250040A | 2016-01-20 | |||
| US20130011815A1 | 2013-01-10 | |||
| CN101730511A | 2010-06-09 | |||
| CN202526325U | 2012-11-14 |
Attorney, Agent or Firm:
JIAQUAN IP LAW FIRM (CN)
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