Title:
DEPOSITION APPARATUS CAPABLE OF APPLYING POWDER PARTICLES, AND METHOD FOR APPLYING POWDER PARTICLES
Document Type and Number:
WIPO Patent Application WO/2019/194347
Kind Code:
A1
Abstract:
The present invention provides an ALD or digital CVD apparatus and method for microparticles, the apparatus and the method using an impact, which is caused by the pulsed introduction of a precursor or a purging gas to be introduced into a reactor, without additional vibration or rotation of the reactor itself so as to inhibit the agglomeration of particles to be applied to a surface and enable dispersion to be maximized, enabling each particle to be uniformly applied, and simultaneously preventing the loss, in the reactor during processing, of a powder to be coated without an additional separate filter or filler. A deposition reactor according to the present invention has a structure in which at least two reactors are arranged so as to overlap each other, and a reactant or a purging gas directly flows into an inner reactor in which a chemical reaction occurs, but a purging step can be simultaneously carried out in inner and outer reactors.
Inventors:
KIM DO HEYOUNG (KR)
Application Number:
PCT/KR2018/005254
Publication Date:
October 10, 2019
Filing Date:
May 08, 2018
Export Citation:
Assignee:
UNIV NAT CHONNAM IND FOUND (KR)
International Classes:
C23C16/44; C23C16/455; C23C16/52
Foreign References:
| KR101696946B1 | 2017-01-16 | |||
| KR20160125982A | 2016-11-01 | |||
| KR20140109234A | 2014-09-15 | |||
| KR20140128645A | 2014-11-06 | |||
| JP2017514009A | 2017-06-01 |
Other References:
See also references of EP 3778986A4
Attorney, Agent or Firm:
YOON & YANG (IP) LLC (KR)
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