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Patent Searching and Data


Title:
DEPOSITION APPARATUS CAPABLE OF APPLYING POWDER PARTICLES, AND METHOD FOR APPLYING POWDER PARTICLES
Document Type and Number:
WIPO Patent Application WO/2019/194347
Kind Code:
A1
Abstract:
The present invention provides an ALD or digital CVD apparatus and method for microparticles, the apparatus and the method using an impact, which is caused by the pulsed introduction of a precursor or a purging gas to be introduced into a reactor, without additional vibration or rotation of the reactor itself so as to inhibit the agglomeration of particles to be applied to a surface and enable dispersion to be maximized, enabling each particle to be uniformly applied, and simultaneously preventing the loss, in the reactor during processing, of a powder to be coated without an additional separate filter or filler. A deposition reactor according to the present invention has a structure in which at least two reactors are arranged so as to overlap each other, and a reactant or a purging gas directly flows into an inner reactor in which a chemical reaction occurs, but a purging step can be simultaneously carried out in inner and outer reactors.

Inventors:
KIM, Do Heyoung (#3218-404, 97 Wiryegwangjang-ro, Sujeong-gu,,Seongnam-si, Gyeonggi-do, 13639, KR)
Application Number:
KR2018/005254
Publication Date:
October 10, 2019
Filing Date:
May 08, 2018
Export Citation:
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Assignee:
INDUSTRY FOUNDATION OF CHONNAM NATIONAL UNIVERSITY (77 Yongbong-ro, Buk-gu, Gwangju, 61186, KR)
International Classes:
C23C16/44; C23C16/455; C23C16/52
Foreign References:
KR101696946B12017-01-16
KR20160125982A2016-11-01
KR20140109234A2014-09-15
KR20140128645A2014-11-06
JP2017514009A2017-06-01
Attorney, Agent or Firm:
YOON & YANG (IP) LLC (4th Fl, 11 Teheran-ro 108-gil,Gangnam-gu, Seoul, 06175, KR)
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