Title:
DEPOSITION GAS SUPPLY APPARATUS
Document Type and Number:
WIPO Patent Application WO/2011/025256
Kind Code:
A2
Abstract:
Disclosed is a deposition gas supply apparatus capable of supplying a constant amount of deposition gas for every deposition process when thin film deposition is performed for fabricating semiconductor devices or flat panel displays. A deposition gas supply apparatus (100) according to the present invention comprises: a deposition material storing unit (200) in which a deposition material is stored; a deposition material evaporating unit (300) which applies heat to the deposition material to generate evaporation gas; and a carrier gas supply unit (400) which supplies a carrier gas. The deposition gas supply apparatus (100) further comprises a deposition material supply unit (500) interposed between the deposition material storing unit (200) and the deposition material evaporating unit (300). The deposition material supply unit (500) supplies a constant amount of deposition material to the deposition material evaporating unit (300) for every deposition process.
Inventors:
LEE BYUNG IL (KR)
PARK KYOUNG WAN (KR)
KANG HO YOUNG (KR)
KIM CHEOL HO (KR)
SONG JONG HO (KR)
PARK KYOUNG WAN (KR)
KANG HO YOUNG (KR)
KIM CHEOL HO (KR)
SONG JONG HO (KR)
Application Number:
PCT/KR2010/005695
Publication Date:
March 03, 2011
Filing Date:
August 25, 2010
Export Citation:
Assignee:
TERA SEMICON CORP (KR)
LEE BYUNG IL (KR)
PARK KYOUNG WAN (KR)
KANG HO YOUNG (KR)
KIM CHEOL HO (KR)
SONG JONG HO (KR)
LEE BYUNG IL (KR)
PARK KYOUNG WAN (KR)
KANG HO YOUNG (KR)
KIM CHEOL HO (KR)
SONG JONG HO (KR)
International Classes:
H01L21/205
Foreign References:
| KR20080098277A | 2008-11-07 | |||
| JP2007103801A | 2007-04-19 | |||
| KR200173175Y1 | 2000-03-02 | |||
| KR20000000946A | 2000-01-15 | |||
| JP2009170800A | 2009-07-30 |
Attorney, Agent or Firm:
KIM, HAN (KR)
김한 (KR)
김한 (KR)
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