Title:
DETECTION UNIT, SEMICONDUCTOR FILM LAYER INSPECTION APPARATUS HAVING SAME, AND INSPECTION METHOD USING SAME
Document Type and Number:
WIPO Patent Application WO/2022/234892
Kind Code:
A1
Abstract:
The present invention provides a semiconductor film layer inspection apparatus (10) and a semiconductor film layer inspection method using the apparatus, the purpose of which is to detect electrical characteristics of a semiconductor film layer (30) formed on one surface of a substrate (20) and having an oxide semiconductor layer (31), the semiconductor film layer inspection apparatus (10) comprising: a base part (40), on one surface of which the substrate is seated; a detection unit (200) for detecting electrical characteristics of the oxide semiconductor layer by contacting at least two points on one surface of the oxide semiconductor layer and applying electrical signals thereto; and a carrier generator (300) for increasing carrier concentration of the oxide semiconductor layer.
Inventors:
MOON KOOK CHUL (KR)
Application Number:
PCT/KR2021/009915
Publication Date:
November 10, 2022
Filing Date:
July 29, 2021
Export Citation:
Assignee:
ENGION CO LTD (KR)
International Classes:
G01R31/28; G01R1/067; G01R1/073; G01R27/26; H01L21/66
Foreign References:
| KR100297283B1 | 2001-10-24 | |||
| KR101163199B1 | 2012-07-05 | |||
| KR100254054B1 | 2000-04-15 | |||
| KR100873181B1 | 2008-12-10 | |||
| US10090208B2 | 2018-10-02 |
Attorney, Agent or Firm:
HONG, Dong Woo (KR)
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