Title:
DEVELOPER RECYCLING SYSTEM FOR NEGATIVE PHOTORESIST
Document Type and Number:
WIPO Patent Application WO/2020/180026
Kind Code:
A1
Abstract:
The present invention relates to a developer recycling system for a negative photoresist and, more specifically, to a developer recycling system for a negative photoresist, which recycles a developer waste liquid recovered after a developing process in the manufacture of semiconductors and displays. An embodiment of a developer recycling system for a negative photoresist according to the present invention comprises: a developer waste liquid recovering tank in which a developer waste liquid recovered after a developing process using a negative photoresist is contained; an ultraviolet (UV) irradiation means for irradiating the developer waste liquid with UV to aggregate the photoresist included in the developer waste liquid contained in the developer waste liquid recovering tank; a developer waste liquid filtration tank having a developer waste liquid inlet, through which the developer waste liquid including the photoresist aggregated by the UV irradiation means is introduced, and a developer waste liquid outlet through which the introduced developer waste liquid is discharged; and a developer waste liquid filtration filter provided in the developer waste liquid filtration tank.
Inventors:
KIM KWANG IL (KR)
JANG HYUNG JIN (KR)
JANG HYUNG JIN (KR)
Application Number:
PCT/KR2020/002451
Publication Date:
September 10, 2020
Filing Date:
February 20, 2020
Export Citation:
Assignee:
CAPSYSTEM (KR)
International Classes:
G03F7/30
Foreign References:
| JPH11125913A | 1999-05-11 | |||
| KR20010071297A | 2001-07-28 | |||
| JPH07281451A | 1995-10-27 | |||
| KR20000047573A | 2000-07-25 | |||
| JP2010054955A | 2010-03-11 |
Attorney, Agent or Firm:
YOO, Jong Woo (KR)
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