Title:
DEVELOPING APPARATUS
Document Type and Number:
WIPO Patent Application WO/2011/152207
Kind Code:
A1
Abstract:
Disclosed is a developing apparatus which can supply a developing solution and a rinse solution at a high speed to the whole surface of a substrate, while having a substrate transfer speed equivalent to conventional speed.
The developing solution is ejected to the substrate, which passes below a developing nozzle by being transferred by a substrate transfer means, while moving the developing nozzle by a developing nozzle moving means in the direction reverse to the transfer direction from a development solution ejection start position where ejection of the developing solution starts, and at the same time, the rinse solution is ejected to the substrate, which passes below a rinse nozzle by being transferred by the substrate transfer means, while moving the rinse nozzle by a rinse nozzle moving means in the direction reverse to the transfer direction from a rinse solution ejection start position where ejection of the rinse solution starts.
Inventors:
SAITOH, Takao (())
斉藤 貴翁 (())
斉藤 貴翁 (())
Application Number:
JP2011/061370
Publication Date:
December 08, 2011
Filing Date:
May 18, 2011
Export Citation:
Assignee:
SHARP KABUSHIKI KAISHA (22-22, Nagaike-cho Abeno-ku, Osaka-sh, Osaka 22, 〒5458522, JP)
シャープ株式会社 (〒22 大阪府大阪市阿倍野区長池町２２番２２号 Osaka, 〒5458522, JP)
SAITOH, Takao (())
シャープ株式会社 (〒22 大阪府大阪市阿倍野区長池町２２番２２号 Osaka, 〒5458522, JP)
SAITOH, Takao (())
International Classes:
H01L21/027; B65G49/06; G02F1/13; G03F7/30; G09F9/00
Attorney, Agent or Firm:
UENO, Noboru (KS Iseya Building 8th Floor, 21-23 Sakae 3-chome, Naka-ku, Nagoya-sh, Aichi 08, 〒4600008, JP)
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Claims:
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