Title:
DEVELOPING APPARATUS
Document Type and Number:
WIPO Patent Application WO/2016/036164
Kind Code:
A1
Abstract:
Disclosed is a developing apparatus capable of suppressing an excessive discharge of a developer from a developer discharge hole. A first opening (106a) for transferring a developer from an inner part of a first case part (105A) to an inner part of a second case part (105B), and a developer discharge hole (107) for discharging the developer are provided at the first case part (105A). A counter blade (126) is provided at a location between the first opening (106a) and the developer discharge hole (107) at a first carrying member (120). The counter blade (126) transfers the developer in the opposite direction of a first carrying blade (124). A gap is prepared between the upper part of the counter blade (126) and the first case part. A cross sectional area of a discharge path (L) of the developer from the counter blade (126) to the developer discharge hole (107) within the first case part (105A) is changed according to the progress along the discharge path (L).
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Inventors:
IWATA NAOYA (JP)
Application Number:
PCT/KR2015/009302
Publication Date:
March 10, 2016
Filing Date:
September 03, 2015
Export Citation:
Assignee:
SAMSUNG ELECTRONICS CO LTD (KR)
International Classes:
G03G15/06; G03G13/06; G03G21/00
Foreign References:
| JP2009192701A | 2009-08-27 | |||
| JP2013025123A | 2013-02-04 | |||
| JP2010160205A | 2010-07-22 | |||
| JP2006293214A | 2006-10-26 | |||
| JP2010186099A | 2010-08-26 |
Attorney, Agent or Firm:
Y.P.LEE, MOCK & PARTNERS (KR)
리앤목 특허법인 (KR)
리앤목 특허법인 (KR)
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