Title:
DEVELOPING UNIT, SUBSTRATE TREATMENT DEVICE, DEVELOPING METHOD, AND SUBSTRATE TREATMENT METHOD
Document Type and Number:
WIPO Patent Application WO/2017/141737
Kind Code:
A1
Abstract:
A substrate in which the film of a metal-containing coating liquid has been exposed to a prescribed pattern is held by a spin chuck. Developing solution is supplied by a slit nozzle to the surface to be treated of the substrate which is supported by the spin chuck. A cleaning solution for removing the metal or dissolving the metal is supplied by a cleaning nozzle to the surface to be treated of the substrate after developing solution has been supplied.
Inventors:
TANAKA YUJI (JP)
ASAI MASAYA (JP)
HARUMOTO MASAHIKO (JP)
KANEYAMA KOJI (JP)
ASAI MASAYA (JP)
HARUMOTO MASAHIKO (JP)
KANEYAMA KOJI (JP)
Application Number:
PCT/JP2017/004035
Publication Date:
August 24, 2017
Filing Date:
February 03, 2017
Export Citation:
Assignee:
SCREEN HOLDINGS CO LTD (JP)
International Classes:
H01L21/027; B05C11/08; G03F7/30; G03F7/32; H01L21/304
Foreign References:
| JP2015075500A | 2015-04-20 | |||
| US20150056542A1 | 2015-02-26 | |||
| JP2015031923A | 2015-02-16 | |||
| JP2011253185A | 2011-12-15 | |||
| JP2009302277A | 2009-12-24 | |||
| JPH06266119A | 1994-09-22 | |||
| EP0042894A1 | 1982-01-06 |
Attorney, Agent or Firm:
FUKUSHIMA, Yoshito (JP)
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