DEVELOPMENT ENHANCEMENT OF RADIATION-SENSITIVE ELEMENTS

Title:

DEVELOPMENT ENHANCEMENT OF RADIATION-SENSITIVE ELEMENTS

Document Type and Number:

WIPO Patent Application WO2004081662

Kind Code:

A3

Abstract:

A positive-working radiation-sensitive composition for use with a radiation source comprises one or more polivinyl acetal polymers capable of being dissolved in an alkaline acqueous solution and a development-enhancing compound. The sensitivity of a radiation-sensitive coating based on the composition of this invention is increased without compromising the handling characteristics. Radiation-sensitive elements based on the composition of the invention have good development latitude. A positive-working lithographic printing precursor is based on the radiation-sensitive composition coated on a hydrophilic surface. The precursor is developable using an alkaline aqueous solution, and may be used with a radiation source in lithographic applications, such as conventional imaging systems, computer-to-plate systems or other direct imaging applications. The precursor is stable in its state before exposure and has an excellent handling property.

Inventors:

MEMETEA LIVIA T (CA)
JARAMILLO JUANA G (CA)
BRADFORD NICHOLAS (CA)
GOODIN JONATHAN W (US)
YANG CHENG (CA)
LEVANON MOSHE (IL)

Application Number:

PCT/CA2004/000381

Publication Date:

December 02, 2004

Filing Date:

March 12, 2004

Export Citation:

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Assignee:

CREO INC (CA)
MEMETEA LIVIA T (CA)
JARAMILLO JUANA G (CA)
BRADFORD NICHOLAS (CA)
GOODIN JONATHAN W (US)
YANG CHENG (CA)
LEVANON MOSHE (IL)

International Classes:

B41C1/10; B41M5/36; G03F7/004; G03F; (IPC1-7): B41C1/10; G03F7/004

Domestic Patent References:

WO2004020484A1

2004-03-11

Foreign References:

US6255033B1

2001-07-03

Other References: