Title:
DEVELOPMENT METHOD, COMPUTER STORAGE MEDIUM, AND DEVELOPMENT APPARATUS
Document Type and Number:
WIPO Patent Application WO/2018/116985
Kind Code:
A1
Abstract:
This development method for developing a resist film on a substrate comprises: a pattern formation step for forming a resist pattern by supplying a developer liquid to a substrate and developing a resist film on the substrate; an application step for applying an aqueous solution of a water-soluble polymer to the developed substrate; and a rinsing step for cleaning the substrate by supplying a rinsing liquid to the substrate to which the aqueous solution of a water-soluble polymer has been applied.
Inventors:
KAI AKIKO (JP)
YOSHIHARA KOUSUKE (JP)
TANAKA KOUICHIROU (JP)
ICHINOMIYA HIROSHI (JP)
YOSHIHARA KOUSUKE (JP)
TANAKA KOUICHIROU (JP)
ICHINOMIYA HIROSHI (JP)
Application Number:
PCT/JP2017/045135
Publication Date:
June 28, 2018
Filing Date:
December 15, 2017
Export Citation:
Assignee:
TOKYO ELECTRON LTD (JP)
International Classes:
H01L21/027; G03F7/30; G03F7/32
Foreign References:
| JP2007095888A | 2007-04-12 | |||
| JP2015023172A | 2015-02-02 | |||
| JP2009094406A | 2009-04-30 | |||
| JP2006059918A | 2006-03-02 |
Attorney, Agent or Firm:
KANEMOTO, Tetsuo et al. (JP)
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