Title:
DEVELOPMENT METHOD, DEVELOPMENT DEVICE, AND RECORDING MEDIUM
Document Type and Number:
WIPO Patent Application WO/2017/187951
Kind Code:
A1
Abstract:
[Problem] To provide a technology for suppressing post-development line width unsteadiness during development of an exposed wafer using a developer.
[Solution] A negative-type developer D is supplied to a wafer W that has been subjected to an exposure process, and a development process is performed. Then, after drying by rotating the wafer W to drain the developer D on the surface, or after pure water P is supplied to the surface of the wafer W and the pure water P replaces the developer D as a liquid residue on the surface of the wafer W, a rinse fluid R is supplied to clean the surface of the wafer W. Accordingly, the developer D and the rinse fluid R do not become mixed, thus suppressing the dissolution, by the mixed solution of the developer D and the rinse fluid R, of a portion of a resist film that has been made insoluble by the exposure. Thus, the unsteadiness in the line width of a circuit pattern formed on the wafer W can be suppressed.
Inventors:
SHIMOAOKI TAKESHI (JP)
HASHIMOTO YUSAKU (JP)
FUKUDA MASAHIRO (JP)
TANAKA KOUICHIROU (JP)
HASHIMOTO YUSAKU (JP)
FUKUDA MASAHIRO (JP)
TANAKA KOUICHIROU (JP)
Application Number:
PCT/JP2017/014713
Publication Date:
November 02, 2017
Filing Date:
April 10, 2017
Export Citation:
Assignee:
TOKYO ELECTRON LTD (JP)
International Classes:
H01L21/027; G03F7/30
Foreign References:
| JP2015031923A | 2015-02-16 | |||
| JP2014135440A | 2014-07-24 | |||
| JP2012173510A | 2012-09-10 | |||
| JP2012074564A | 2012-04-12 | |||
| JP2011033841A | 2011-02-17 | |||
| JP2009238899A | 2009-10-15 | |||
| JP2003178946A | 2003-06-27 | |||
| JPH0869961A | 1996-03-12 |
Attorney, Agent or Firm:
INOUE, Toshio et al. (JP)
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