Title:
DEVELOPMENT UNIT, SUBSTRATE TREATMENT DEVICE, DEVELOPMENT METHOD, AND SUBSTRATE TREATMENT METHOD
Document Type and Number:
WIPO Patent Application WO/2018/088071
Kind Code:
A1
Abstract:
A metal-containing coating film is formed on one surface of the substrate, an organic coating film is formed on the metal-containing coating film using a light-sensitive organic material; and the organic coating film is exposed to a prescribed pattern. A developer is fed by a slit nozzle onto the organic coating film, whereby the prescribed pattern is formed on the organic coating film. A substitution solution is fed by a substitution nozzle onto the metal-containing coating film and the pattern of the organic coating film, whereby the metal-containing coating film portion is removed and the prescribed pattern is formed on the metal-containing coating film. A rinsing solution is fed by a rinsing nozzle onto the substrate having the pattern of the organic coating film and the pattern of the metal-containing coating film.
Inventors:
HARUMOTO MASAHIKO (JP)
ASAI MASAYA (JP)
TANAKA YUJI (JP)
KANEYAMA KOJI (JP)
ASAI MASAYA (JP)
TANAKA YUJI (JP)
KANEYAMA KOJI (JP)
Application Number:
PCT/JP2017/036073
Publication Date:
May 17, 2018
Filing Date:
October 04, 2017
Export Citation:
Assignee:
SCREEN HOLDINGS CO LTD (JP)
International Classes:
H01L21/027; G03F7/30; G03F7/32; G03F7/40
Foreign References:
| JP2012209299A | 2012-10-25 | |||
| JP2012071516A | 2012-04-12 | |||
| JP2010237614A | 2010-10-21 | |||
| JP2003109897A | 2003-04-11 | |||
| JPH07226358A | 1995-08-22 |
Attorney, Agent or Firm:
FUKUSHIMA, Yoshito (JP)
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