DEVICE FOR APPLYING LIQUID ON RAIL

WIPO Patent Application WO/2006/080071

A1

[PROBLEMS] A device for applying liquid on a rail, capable of preventing wasteful flowing down of the expensive application liquid to suppress the total amount of discharge of the liquid, reducing costs and further suppressing occurrence of environment pollution, and capable of preventing slippage of a wheel involved in excess liquid application. [MEANS FOR SOLVING PROBLEMS] A device for applying liquid on a rail has a tank, a liquid discharge pump for receiving supply of application liquid from the tank and performing liquid discharge operation as a wheel passes, and a liquid application unit for discharging the application liquid on to a rail upon being supplied with the liquid from the liquid discharge pump. The liquid application unit has a nozzle block (40) having arranged in its upper surface a large number of nozzle holes (43). The nozzle block (40) has on its end section a hole-less end section (40a) where no nozzle holes are provided. The nozzle block (40) is pressed and supported from diagonally below, such that a rail-side end edge (40b) of the nozzle block (40) is always in intimate contact with a rolling surface of the rail, by a nozzle block support device (50) that holds a base of the rail from below.

WAKAMATSU MAKOTO (JP)
HOSOKAWA TAKAHIRO (JP)
ITO SAICHI (JP)

PCT/JP2005/001128

August 03, 2006

January 27, 2005

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ITO IRONWORKS CORP (JP)
ITAKE CORP (JP)
WAKAMATSU MAKOTO (JP)
HOSOKAWA TAKAHIRO (JP)
ITO SAICHI (JP)

B61K3/00

JP2003127858A	2003-05-08
JP2003276604A	2003-10-02
JPS4324722Y1	1968-10-18
JPH0717801U	1995-03-31
JPH0314448Y2	1991-03-29
JP2002541020A	2002-12-03

Saitoh, Haruo (Kyobashi 2-chome Chuo-ku, Tokyo 31, JP)

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