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Patent Searching and Data


Title:
DEVICE FOR ELECTROLYTIC ETCHING AND METHOD FOR EXTRACTING METAL COMPOUND PARTICLES
Document Type and Number:
WIPO Patent Application WO/2017/142084
Kind Code:
A1
Abstract:
The present invention addresses the problem, in the extraction or analysis of metal fine particles (inclusions, precipitate) in a metal material by means of electrolytic etching using a solvent electrolyte solution, of suppressing surface substitution of the metal fine particles by Cu ions and the like and preventing the generation of artifact CuS and the like without significantly changing conventional extraction/analysis methods, and causing a metal that has been precipitated on a cathode to actively adhere to the cathode so that the metal precipitate does not become a source of contamination. Provided are: an electrolytic etching device for separating and extracting metal compound particles in a metal material, said device being provided with an electrolytic cell that has a cathode at least a portion of which is provided with a member comprising a metal M' wherein Δ as defined in the belowmentioned formula is 10 or more, and accommodates an electrolyte solution that includes a non-aqueous solvent and an agent that forms a complex that includes the metal M'; and an extraction method. Δ = pKsp[M'x'Ay']-pKsp[MxAy] = (-log10Ksp[M'x'Ay'])-(-log10Ksp[MxAy])

Inventors:
MIZUKAMI KAZUMI (JP)
Application Number:
PCT/JP2017/005995
Publication Date:
August 24, 2017
Filing Date:
February 17, 2017
Export Citation:
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Assignee:
NIPPON STEEL & SUMITOMO METAL CORP (JP)
International Classes:
G01N1/32; C25F3/02; G01N33/20
Foreign References:
JPH07260772A1995-10-13
JP2007127454A2007-05-24
Other References:
See also references of EP 3418711A4
Attorney, Agent or Firm:
AOKI, Atsushi et al. (JP)
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