Title:
DEVICE FOR FORMING AND METHOD FOR FORMING MICRO-TEXTURED PATTERN, METHOD FOR PRODUCING TRANSFER SUBSTRATE, AND TRANSFER SUBSTRATE
Document Type and Number:
WIPO Patent Application WO/2011/122439
Kind Code:
A1
Abstract:
In one embodiment, the disclosed method for forming a micro-textured pattern is provided with: a transfer step wherein the micro-textured pattern of a mold is transferred to the resist layer of a transfer substrate on which the resist layer has been formed, and then curing the aforementioned transferred micro-textured pattern; and a detachment step wherein the aforementioned transfer substrate and the aforementioned mold are detached after the aforementioned transferred micro-textured pattern has been cured. The aforementioned detachment step is provided with: a first detachment step wherein pressure is applied to the back surface of the aforementioned transfer substrate while in the state of the edge section of the aforementioned transfer substrate being immobilized, thus bending the aforementioned transfer substrate into an arc and initiating the detachment of the aforementioned transfer substrate and the aforementioned mold by means of the bending of the aforementioned transfer substrate; and a second detachment step wherein the portion out of the aforementioned micro-textured pattern of micro-textured pattern that did not detach in the aforementioned first detachment step is detached by means of gradually decreasing the aforementioned applied pressure in a manner so as to undo the bending of the aforementioned transfer substrate. This method for producing a transfer substrate produces a transfer substrate by means of the aforementioned method of formation.
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Inventors:
OKADA, Shinichiro (210 Nakanuma Minami-Ashigara-sh, Kanagawa 93, 〒2500193, JP)
岡田 信一郎 (〒93 神奈川県南足柄市中沼２１０番地 富士フイルム株式会社内 Kanagawa, 〒2500193, JP)
岡田 信一郎 (〒93 神奈川県南足柄市中沼２１０番地 富士フイルム株式会社内 Kanagawa, 〒2500193, JP)
Application Number:
JP2011/057178
Publication Date:
October 06, 2011
Filing Date:
March 24, 2011
Export Citation:
Assignee:
FUJIFILM Corporation (26-30, Nishiazabu 2-chome Minato-k, Tokyo 20, 〒1068620, JP)
富士フイルム株式会社 (〒20 東京都港区西麻布２丁目２６番３０号 Tokyo, 〒1068620, JP)
OKADA, Shinichiro (210 Nakanuma Minami-Ashigara-sh, Kanagawa 93, 〒2500193, JP)
富士フイルム株式会社 (〒20 東京都港区西麻布２丁目２６番３０号 Tokyo, 〒1068620, JP)
OKADA, Shinichiro (210 Nakanuma Minami-Ashigara-sh, Kanagawa 93, 〒2500193, JP)
International Classes:
B29C59/02; B29C33/44; H01L21/027
Attorney, Agent or Firm:
MATSUURA, Kenzo (Matsuura & Associates, P.O. Box 176 Shinjuku Sumitomo Bldg. 23F, 6-1, Nishi-shinjuku 2-chome, Shinjuku-k, Tokyo 23, 〒1630223, JP)
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Claims:
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