Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
DEVICE AND METHOD FOR CLEANING NOXIOUS GAS
Document Type and Number:
WIPO Patent Application WO/1999/061137
Kind Code:
A1
Abstract:
A device for cleaning a noxious gas comprising a means (11) for supplying a gas containing a noxious gas component, a buffer means using a liquid (42) which dissolves the noxious gas component in the supplied gas temporarily for later releasing, and a means (51) for cleaning the noxious gas component in the gas supplied from the buffer means, wherein the liquid (42) in the buffer means dissolves the noxious gas component when the concentration of the noxious gas component in the supplied gas is high and releases the noxious gas component dissolved thus far when the concentration is low, water being used as the liquid when the noxious gas is ethylene oxide.

Inventors:
SHIMAKAWA KENZO (JP)
Application Number:
PCT/JP1999/002753
Publication Date:
December 02, 1999
Filing Date:
May 25, 1999
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
SHIMAKAWA SEISAKUSYO CO LTD (JP)
SHIMAKAWA KENZO (JP)
International Classes:
B01D53/14; B01D53/18; B01D53/86; (IPC1-7): B01D53/78; B01D53/72; B01D53/86
Foreign References:
JPH09314116A1997-12-09
JPH05293326A1993-11-09
JPS57165223U1982-10-18
JPH1190177A1999-04-06
JPH08215540A1996-08-27
JPH06304595A1994-11-01
JPS57184414A1982-11-13
JPS574214A1982-01-09
JPH11179151A1999-07-06
Other References:
See also references of EP 1090674A4
Attorney, Agent or Firm:
Ikeuchi, Hiroyuki (Nishitenma 4-chome Kita-ku, Osaka-shi Osaka, JP)
Download PDF: