Title:
DEVICE AND METHOD FOR MANAGING FINE PARTICLE CONCENTRATION
Document Type and Number:
WIPO Patent Application WO/2020/235812
Kind Code:
A1
Abstract:
An aspect of the present invention relates to a device for supplying a charge to a target area and managing a fine particle concentration of the target area, the device comprising: a container for storing a liquid; at least one nozzle for outputting the liquid; a pump for supplying the liquid from the container to the at least one nozzle; a power source for supplying electric power to the device; and a controller for supplying a charge to the target area through the at least one nozzle by using the power source, wherein the controller applies a voltage having a value equal to or greater than a reference value to the at least one nozzle by using the power source, and an electric force in a direction away from the device is provided to a fine particle in the target area charged by the supplied charge.
Inventors:
KIM JAEHYUN (KR)
LEE SANG WON (KR)
BAE INSHIK (KR)
LEE SANG WON (KR)
BAE INSHIK (KR)
Application Number:
PCT/KR2020/005123
Publication Date:
November 26, 2020
Filing Date:
April 16, 2020
Export Citation:
Assignee:
AETHER INC (KR)
International Classes:
B03C3/16; B03C3/68
Foreign References:
| KR20070090438A | 2007-09-06 | |||
| JPH0794022B2 | 1995-10-11 | |||
| KR20150024311A | 2015-03-06 | |||
| JP2010155200A | 2010-07-15 | |||
| KR20090104404A | 2009-10-06 |
Attorney, Agent or Firm:
IPS PATENT FIRM (KR)
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