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Patent Searching and Data


Title:
DEVICE AND METHOD FOR MANAGING FINE PARTICLE CONCENTRATION
Document Type and Number:
WIPO Patent Application WO/2020/235812
Kind Code:
A1
Abstract:
An aspect of the present invention relates to a device for supplying a charge to a target area and managing a fine particle concentration of the target area, the device comprising: a container for storing a liquid; at least one nozzle for outputting the liquid; a pump for supplying the liquid from the container to the at least one nozzle; a power source for supplying electric power to the device; and a controller for supplying a charge to the target area through the at least one nozzle by using the power source, wherein the controller applies a voltage having a value equal to or greater than a reference value to the at least one nozzle by using the power source, and an electric force in a direction away from the device is provided to a fine particle in the target area charged by the supplied charge.

Inventors:
KIM JAEHYUN (KR)
LEE SANG WON (KR)
BAE INSHIK (KR)
Application Number:
KR2020/005123
Publication Date:
November 26, 2020
Filing Date:
April 16, 2020
Export Citation:
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Assignee:
AETHER INC (KR)
International Classes:
B03C3/16; B03C3/68
Foreign References:
KR20070090438A2007-09-06
JPH0794022B21995-10-11
KR20150024311A2015-03-06
JP2010155200A2010-07-15
KR20090104404A2009-10-06
Attorney, Agent or Firm:
IPS PATENT FIRM (KR)
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