DEVICE AND METHOD FOR MEASURING OVERLAY ERROR

WIPO Patent Application WO/2017/148322

A1

Disclosed is a device and method for measuring an overlay error. A measuring light adjustment assembly for adjusting measuring light to be centrosymmetric relative to the optical axis of a microobjective (46) is added to the device, so that the measuring light forms positive and negative level diffraction light by passing through this device and through an overlay measurement mark, and finally a diffraction spectrum of the positive and negative level diffraction light is displayed on a detector (411), wherein the spectrum of the positive level diffraction light and the negative level diffraction light on the diffraction spectrum are staggered to each other. A control system calculates an overlay error according to the diffraction spectrum, such that a broadband light source can be used during resource selection. Therefore, by means of this device and method, the wavelength range of measuring light is wider and any light spot-shaped light source can be used, such that the acquired measuring signals are more abundant, the precision of measurement is improved and the utilization rate of light energy is higher. A small-sized overlay measurement mark also can receive measuring light, and the device and method are also suitable for small-sized measured objects, thereby being better adapted to fine semiconductor products.

PENG BOFANG (CN)
LU HAILIANG (CN)
WANG FAN (CN)

PCT/CN2017/074508

September 08, 2017

February 23, 2017

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SHANGHAI MICRO ELECTRONICS EQUIPMENT (GROUP) CO LTD (CN)

G03F9/00; G03F7/20

CN105278253A	2016-01-27
CN1619769A	2005-05-25
US20120206729A1	2012-08-16
CN103777467A	2014-05-07

SHANGHAI SAVVY INTELLECTUAL PROPERTY AGENCY (CN)

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