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Patent Searching and Data


Title:
DEVICE AND METHOD FOR SUPPLYING RAW MATERIAL
Document Type and Number:
WIPO Patent Application WO/2018/110797
Kind Code:
A1
Abstract:
A raw material supply device is disclosed. A device for removing a surface oxide from a metal raw material and supplying the metal raw material to a melting furnace, according to an embodiment of the present invention, comprises: a housing including a raw material dropping chamber into or from which a metal raw material is put or discharged and a raw material etching chamber for performing plasma etching; and a pre-treatment casing installed to be able to reciprocate between the raw material dropping chamber and the raw material etching chamber in the housing, wherein the pre-treatment casing receives a metal raw material supplied from the raw material dropping chamber and stores the same, moves to the raw material etching chamber to plasma-etch a surface oxide layer of the stored metal raw material, and then returns back to the raw material dropping chamber to drop the etched metal raw material into the melting furnace.

Inventors:
LIM, Seung Ho (301-1403, 88 Hyoseong-ro, Nam-gu,Pohang-si, Gyeongsangbuk-do, 37835, KR)
KIM, Goo Hwa (109-1003, 62, Yugang-gil 9beon-gil, Yeonil-eup, Nam-gu,Pohang-si, Jeollanam-do, 37656, KR)
NAM, Kyung Hoon (7-704, 73 Geumho-ro,Gwangyang-si, Jeollanam-do, 57811, KR)
PARK, Yeong Seon (303, 25 Sangdo-ro 39-gil,Dongjak-gu, Seoul, 06968, KR)
Application Number:
KR2017/009282
Publication Date:
June 21, 2018
Filing Date:
August 24, 2017
Export Citation:
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Assignee:
POSCO (6261, Donghaean-ro,Nam-gu,Pohang-si, Gyeongsangbuk-do, 37859, KR)
International Classes:
F27D3/10; B22F1/00; C23F4/00; F27D3/00; F27D13/00
Foreign References:
JPH06330197A1994-11-29
JP2015151586A2015-08-24
KR20000011065A2000-02-25
JP2001082879A2001-03-30
KR20160115935A2016-10-06
Attorney, Agent or Firm:
SELIM INTELLECTUAL PROPERTY LAW FIRM (10F and 11F, Taewoo Bldg. 285, Gangnam-daero,Seocho-gu, Seoul, 06729, KR)
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