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Patent Searching and Data


Title:
DEVICE AND METHOD FOR THE TREATMENT OF FLAT MATERIAL TO BE TREATED
Document Type and Number:
WIPO Patent Application WO/2014/076078
Kind Code:
A3
Abstract:
The device (1) according to the invention is suggested for gentle treatment of a flat material (B) to be treated with a treatment liquid (F). The device (1) has the following components: at least one treatment chamber (20), in which the treatment liquid (F) can be accumulated up to a bath level (M), at least one supply device (7) for the supply of the treatment liquid (F) into the at least one treatment chamber (20), at least one transport device (30), with which the material (B) to be treated can be transported in the horizontal position in a transport plane (E) below the bath level (M) through the at least one treatment chamber (20), at least one reception area (4) for the treatment liquid (F), and at least one discharge device (40) with, respectively, at least one discharge opening (41) for the treatment liquid (F) for conveying it from the at least one treatment chamber (20) with a respective discharge rate into the at least one reception area (4). The at least one discharge device (40) respectively has at least one regulating system (43), with which the discharge rate of the treatment liquid (F) is adjustable through the at least one discharge opening (41).

Inventors:
WIENER FERDINAND (DE)
THOMAS CHRISTIAN (DE)
LORENZ OLAF (DE)
Application Number:
PCT/EP2013/073617
Publication Date:
December 04, 2014
Filing Date:
November 12, 2013
Export Citation:
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Assignee:
ATOTECH DEUTSCHLAND GMBH (DE)
International Classes:
C25D7/06; C23C18/16; C25D17/00
Foreign References:
US20120231574A12012-09-13
JP2010037600A2010-02-18
JPH05331687A1993-12-14
US6068755A2000-05-30
Attorney, Agent or Firm:
BRESSEL, Burkhard (Potsdamer Platz 10, Berlin, DE)
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