of flat material to be treated.

The invention relates to a device and a method for the wet-chemical treatment of flat material to be treated. In particular, the invention relates to a device of this type and a method of this type in which the material to be treated is transported in a horizontal pass-through system and is sequentially treated with different liquids.

When processing flat material to be treated, for example a substrate for use in the circuit board industry, such as circuit boards or the like, a treatment of the material to be treated often takes place in a wet-chemical process line. In a multi-stage process, in which the material to be treated is treated with different process chemicals, it is often necessary to prevent the carry-over of a first process chemical, with which the material to be treated is treated in a first active module, into a second active module, in which the material to be treated is treated with a second process chemical, so as to keep low a concentration of interfering introductions in the treatment liquid in the second active module.

In order to keep low the carry-overs, rinsing stages can be provided between treatment modules. To save water whilst simultaneously observing a desired rinsing criterion, a rinsing cascade consisting of a plurality of rinsing stages can be provided, for example. DE 44 18 277 A1 describes a method for purifying, in a dipping bath system, material to be treated, said material being dipped sequentially in said dipping bath system into different rinsing baths of a rinsing cascade. In order to avoid a carry-over of process chemicals in a pass-through system, a rinsing module or a rinsing cascade can be provided between two active modules, in which the material to be treated is treated with different process chemicals.

Figure 5 is a schematic illustration of a conventional rinsing cascade 124 for a horizontal pass-through system, in which the material to be treated is transported in a horizontal direction of transport 9. The material to be treated is moved during the transport process in a horizontal transport plane 10. The rinsing cascade 124 has a plurality of rinsing modules 125, 126 and 127. The rinsing module 125 comprises a treatment region 131 for rinsing the material to be treated, a sump region 132, from which the rinsing liquid is removed and is fed to the treatment region 131 , and a plurality of what are known as squeezing rolls 141 -146, which are arranged in pairs and which remove process or rinsing liquid from the material to be treated. Instead of squeezing rolls, blow-off arrangements or the like may also be used in conventional rinsing modules. In the treatment region 131 , a distribution element 134 is provided, to which rinsing liquid from the sump region 132 is fed via a pump 133 and which subjects the material to be treated to an incident flow of rinsing liquid. The treatment region 131 is delimited in the direction of transport by interspaced walls 136 and 138, which each have a pair of squeezing rolls 143, 144 respectively. In the treatment region 131 formed by the walls 136, 138 and the base 139 of a collection trough, the rinsing liquid can be backed up to a level 135.

The rinsing modules 126 and 127 are constructed similarly. The rinsing module 126 has a treatment region 151 and squeezing rolls 152, 153. The rinsing module 127 has a treatment region 154 and squeezing rolls 155, 156. In the sump, partition walls between the rinsing modules 125, 126 and 127 are designed such that a cascade of levels of the rinsing liquid increasing in the direction of transport is produced in the sump regions. To this end, overflow weirs are provided in the sump region between the treatment modules, the height of said overflow weirs increasing in the direction of transport. A level 161 of the rinsing liquid set in the sump region 132 of the first rinsing module 125 is lower than a level 162 of the rinsing liquid set in the sump region of the second rinsing module 126. The level 162 of rinsing liquid set in the sump region of the second rinsing module 126 is in turn lower than a level 163 of rinsing liquid set in the sump region of the third rinsing module 127. A flow 166 of a rinsing liquid with low impurity concentration is fed to the rinsing module 127 arranged last in the direction of transport. A flow 167 of rinsing liquid having the highest concentration of impurities is diverted from the first rinsing module 125. The cascading of the levels in the sump region produces a flow 165 of rinsing liquid from the third rinsing module 127 into the second rinsing module 126, and a flow 164 of rinsing liquid from the second rinsing module 126 into the first rinsing module 125, such that the material to be treated is treated in the rinsing modules 125-127 successively with a rinsing liquid that has a decreasing concentration of impurities.

Whereas the squeezing rolls 141 -146, 152, 153, 155 and 156 on the one hand help to achieve a predefined rinsing criterion, for example a dilution of 1 :1 ,000 or 1 :10,000, they lead on the other hand to a relatively large overall length of the conventional rinsing cascade 124.

Since the squeezing rolls do not completely hold off the liquid on the upper face of the goods, fluid flows may be produced between two pairs of rolls and may deflect a flexible substrate from the transport plane in such a way that said substrate no longer passes reliably between a subsequent pair of rolls, such that there is the risk that the flexible substrate is compressed and/or damaged.

The object of the invention is to specify an improved device and an improved method for treating flat material to be treated for a horizontal pass- through system, in particular a device of this type or a method of this type in which the overall length of a treatment stage, in particular a rinsing stage, can be reduced. Furthermore, flexible substrate is to be transported reliably and without damage in the region of the transition between two treatment regions.

The object is achieved in accordance with the invention by a device and a method as are specified in the independent claims. The dependent claims define preferred or advantageous embodiments of the invention.

A device for the wet-chemical treatment of flat material to be treated for a horizontal pass-through system comprises, in accordance with one aspect, a first treatment module, a second treatment module, back-up means and a transport arrangement. The first treatment module is designed to treat with a first liquid the material to be treated. The second treatment module is designed to treat with a second liquid the material to be treated. The back-up means are designed to back up the first liquid in a first treatment region of the first treatment module and to back up the second liquid in a second treatment region of the second treatment module. The transport arrangement is designed to transport the material to be treated in a horizontal transport plane through the first treatment region and the second treatment region. Here, the device is designed such that the material to be treated is transferred directly between the first and the second treatment region. Since, with the device, the material to be treated is transferred directly between the first and the second treatment region, the overall length of the device can be reduced, since it is no longer necessary to provide drying regions between the treatment regions.

In the case of the device according to the invention, the treatment region is the region of the corresponding treatment module in which the back-up means back up the liquid such that the material to be treated, as it passes through the treatment region, is wetted and treated by the respective liquid.

A "direct transfer" is understood here to mean that the material to be treated does not pass through a treatment path separate from the first and the second treatment region when it is transferred between the first treatment region and the second treatment region. Here, a treatment path is understood generally to mean a portion of a pass-through system extending in the direction of transport and in which the material to be treated is subject to an incident flow of a fluid and/or in which liquid is removed from the material to be treated using a suitable treatment member, for example using a roll or a pair of rolls. The "direct transfer" can be implemented such that the material to be treated, when transferred between the first and the second treatment region, is guided only past one partition element delimiting the two treatment regions from one another. The maximum extension of the partition element in the direction of transport may be smaller than a length of the second treatment module, in particular smaller than half the length of the second treatment module. In particular, the partition element may consist of a partition wall and a pair of rolls arranged thereabove, that is to say a lower and an upper roll. In an exemplary embodiment, the first treatment module may be an active module, in the treatment region of which the material to be treated is treated with a process chemical, and the second treatment module may be a rinsing module, in the treatment region of which the material to be treated is rinsed with a rinsing liquid different from the process chemical, for example water.

In a further exemplary embodiment, the first treatment module may be a rinsing module, in the first treatment region of which the material to be treated is rinsed with a rinsing liquid having a first concentration of impurities, and the second treatment module may be a rinsing module, in the second treatment region of which the material to be treated is rinsed with a rinsing liquid having a second concentration of impurities, the first and second concentration being different.

Each of the treatment modules may have a sump region, which in each case is provided separately from the treatment region and from which the liquid is conveyed into the treatment region of the treatment module. The sump region can be spaced vertically from the treatment region.

The back-up means can be designed to back up the liquid in the first treatment region and the liquid in the second treatment region at least as far as a lower face of the material to be treated, preferably as far as a level above the upper face of the material to be treated. In this way, the material to be treated may be continuously in contact with the first or second liquid during transport through the first or second treatment region respectively.

The back-up means can be designed to back up the respective liquid in the first treatment region over the entire length of the first treatment mod- ule and in the second treatment region over the entire length of the second treatment module.

The device may comprise at least one partition element, which extends between the first treatment region and the second treatment region transversely to a direction of transport of the material to be treated. The backup means can be designed to back up the first liquid and the second liquid such that the first liquid is waiting directly on one side of the at least one partition element and the second liquid is waiting directly on an opposite side of the at least one partition element.

The at least one partition element may comprise, for example, a wall, a wall and a roll, or a wall and a pair of rolls.

The at least one partition element may delimit on at least one side a horizontally extending gap for passing through the material to be treated, for example at the lower edge or upper edge of a gap running horizontally transversely to the direction of transport. The device can be designed to prevent a flow of the first or second liquid through the gap. In this way, an introduction of second liquid from the second treatment module into the first liquid in the first treatment module and vice versa can be kept below a determined limit value.

In order to prevent the flow of first liquid and second liquid through the gap, means for setting liquid levels can be provided, which set a level of the first liquid and a level of the second liquid such that a difference between a hydrostatic pressure of the first liquid and a hydrostatic pressure of the second liquid in the gap is less than a predefined threshold value over an overall height of the gap. The threshold value can be selected such that a resultant volume flow rate of the first and/or second liquid be- tween the first treatment region and the second treatment region is less than 100 l/h, in particular less than 10 l/h, in particular less than 1 l/h.

The device may comprise at least one further rinsing module having a further treatment region for treating with a rinsing liquid the material to be treated. The back-up means can be designed to back up the rinsing liquid in the treatment region of the further rinsing module at least as far as a lower face of the material to be treated, preferably as far as a level above the other face of the material to be treated. The device can be designed to transfer the material to be treated directly between the second treatment region and the at least one further treatment region. In this way, a rinsing cascade with a plurality of rinsing modules can be produced. Since the material to be treated is transferred directly between the second treatment region and the at least one further treatment region, the rinsing cascade may have a compact overall length.

The device can be designed to set a level cascade in the treatment regions of the rinsing modules. To this end, suitable means for setting liquid levels, which for example comprise overflow weirs or an active level control, may be provided. The level cascade in particular may have levels rising in the direction of transport.

A partitioning arrangement which forms a gap for passing through the material to be treated may be provided between two adjacent rinsing modules. The partitioning arrangement is designed to set, in the gap formed by the partitioning arrangement, a flow of the rinsing liquid directed against the direction of transport. The two adjacent rinsing modules may be the second treatment module and a further rinsing module adjacent thereto, or two further rinsing modules of the at least one further rinsing module. The partitioning arrangement may comprise a wall, a wall in combination with a roll, a wall in combination with a gap-forming element, for example a pair of rolls, or the like. Due to the flow through the gap of rinsing liquid directed against the direction of transport, a carry-over of impurities into a rinsing module arranged downstream in the direction of transport can be kept small.

In order to guide through the gap the flow of rinsing liquid directed against the direction of transport of the material to be treated, means for setting liquid levels can be provided. The levels of the rinsing liquid in the adjacent rinsing modules can then be set in such a way that the level in the treatment region of the rinsing module arranged downstream in the direction of transport is higher than in the treatment region of the rinsing module arranged upstream in the direction of transport. Alternatively or additionally, a distribution arrangement, for example a distribution nozzle, can be provided in at least one of the adjacent rinsing modules, said arrangement being designed to allow the rinsing liquid to flow with a speed component in the direction of the gap provided between the adjacent rinsing modules in order to create the flow of rinsing liquid through the gap against the direction of transport.

The back-up means can be designed to back up the first liquid, the second liquid and the rinsing liquid in such a way that a material to be treated transported by the transport arrangement, when transported through the first treatment module, the second treatment module and the at least one further rinsing module, is covered constantly over its entire length with at least one of the first liquid, the second liquid or the rinsing liquid. The permanent covering with one of the first liquid, the second liquid or the rinsing liquid may reduce problems with respect to a deflection of the material to be treated in the case of treatment of thin material to be treated having lower inherent rigidity. The back-up means can be designed to back up the second liquid in at least one treatment region in such a way that the treatment region has two portions which are adjacent in the direction of transport and which have different levels. An embodiment of this type allows a rinsing module, arranged last in the direction of transport, of a rinsing cascade to have in its treatment region a first portion with a first liquid level and a second portion with a second liquid level. A liquid flow between the two modules against the direction of transport can thus be achieved by a level in the first portion above the level of a rinsing module that is adjacent against the direction of transport. At the same time, due to a suitable level in the second portion, a liquid flow to an active module adjacent in the direction of transport, in which the material to be treated is treated with a process chemical, can be kept small.

In accordance with a further aspect of the invention, in a method for the wet-chemical treatment of flat material to be treated in a horizontal pass- through system, the material to be treated is treated in a first treatment module with a first liquid and is treated in a second treatment module with a second liquid, in particular a rinsing liquid, and is transported in a horizontal transport plane through the first treatment module and the second treatment module. Here, the material to be treated is transported directly between a first treatment region of the first treatment module, in which the first liquid is backed up, and a second treatment region of the second treatment module, in which the second liquid is backed up.

The first treatment liquid can be backed up in the first treatment region over the entire length of the first treatment module. The second treatment liquid can be backed up in the second treatment region over the entire length of the second treatment module. Developments of the method are specified in the dependent claims.

In accordance with a further aspect, the invention provides a rinsing module, which is designed for use in a horizontal pass-through system for the wet-chemical treatment of flat material to be treated. The rinsing module comprises a treatment region for rinsing the material to be treated, a transport arrangement for transporting the material to be treated through the treatment region in a direction of transport, and a sump region associated with the treatment region. The rinsing module is designed such that a length of the treatment region, measured along the direction of transport, is at least 50 % of the length of the rinsing module. In particular, the rinsing module can be designed such that the length of the treatment region is at least 75 %, in particular at least 90 %, in particular 100 %, of the length of the rinsing module.

Here, the length of the treatment region may be defined as the minimum distance between a first and second wall, which delimit the treatment region in the direction of transport. The length of the rinsing module can be defined as the maximum of the length of the treatment region and of a length of the sump region of the rinsing module. The length of the sump region can be defined as the minimum distance between a third and fourth wall, which delimit the sump region in the direction of transport.

The rinsing module may have means for setting a level difference in order to create a level difference between a level of the rinsing liquid in a first portion and a level of the rinsing liquid in a second portion of the treatment region of the rinsing module. Devices and methods according to various exemplary embodiments of the invention make it possible to reduce the overall length of at least one portion of a horizontal pass-through system for the wet-chemical treatment of flat material to be treated. With devices and methods according to various exemplary embodiments, the overall length of a rinsing module in a rinsing cascade and/or the overall length of a rinsing cascade can thus be reduced. Furthermore, flexible substrate can be treated with greater reliability and a deflection of the flexible substrate can be reduced.

Exemplary embodiments of the invention can be used in systems in which flat material to be treated is transported in a horizontal or substantially in a horizontal transport plane, for example in systems for chemical treatment, in particular electrochemical treatment, of circuit boards, film-like material, conducting tracks, or the like. The exemplary embodiments however are not limited to this field of application.

The invention will be explained in greater detail hereinafter on the basis of preferred or advantageous exemplary embodiments with reference to the accompanying drawings.

Figure 1 is a schematic sectional view, in accordance with an exemplary embodiment, of a device for treating flat material to be treated.

Figure 2 is a schematic sectional view of a rinsing module according to an exemplary embodiment, which can be used in the device of Figure 1 .

Figure 3 is a schematic sectional view, in accordance with a further exemplary embodiment, of a device for treating flat material to be treated. Figure 4 is a schematic sectional view for explaining liquid levels that can be produced with devices in accordance with various exemplary embodiments.

Figure 5 is a schematic sectional view of a conventional rinsing cascade.

The exemplary embodiments will be described in the context of a system for treating material to be treated, in which the material to be treated is transported in a horizontal transport plane. The plane in which the lower face of the material to be treated is transported in the pass-through system is referred to conventionally as the transport plane. The transport plane is defined by the embodiment of the transport arrangement, for example by the layout of transport elements which support from below the material to be treated. Specifications such as "above the transport plane" or "below the transport plane", "upper surface", "lower surface" and also references to a height or a level of treatment liquid and the like are based accordingly on the vertical direction unless specified otherwise. Specifications concerning direction or position which relate to the material to be treated are specified conventionally with regard to the direction of transport. The direction which is parallel or antiparallel to the direction of transport during transport of the material to be treated is referred to as the longitudinal direction.

Figure 1 is a schematic sectional view of a device 1 for treating flat material to be treated 8, which may be a circuit board, conductor foil, conducting track or the like, for example.

The device 1 comprises a first active module 2 for treating with a first process chemical the material to be treated 8, a second active module 3 for treating with a second process chemical the material to be treated 8, and a rinsing arrangement 4, which is provided between the first active module 2 and the second active module 3 and which is formed as a rinsing cascade having a plurality of rinsing modules 5-7. A transport arrangement transports the material to be treated 8 in a direction of transport 9 through the first active module 2, the rinsing arrangement 4 and the second active module 3, the material to be treated 8 being transported in a horizontal transport plane 10. The transport arrangement comprises suitable transport elements, which, for transport of the material to be treated 8, can be coupled to at least one portion of the material to be treated 8. The transport elements may comprise retaining brackets, axles with wheels, portions of pairs of rolls described later in greater detail, or the like.

The first active module 2 has a treatment region 1 1 and a sump region 12. By means of a pump 13, the first process chemical is conveyed from the sump region 12 of the first active module 2 to a distribution arrangement 14 in the treatment region 1 1 . The distribution arrangement 14 for example may comprise a distribution nozzle in order to subject the material to be treated 8 to an incident flow of the first process chemical. By means of back-up means, which may comprise a base 22a of a collection trough and a partitioning arrangement 36 provided between the treatment region 1 1 of the first active module 2 and a treatment region 31 of the first rinsing module 5, the first process chemical can be backed up in the treatment region 1 1 of the first active module 2 as far as a level 15 that is higher than the transport plane 10. The sump region 12 of the first active module 2 is separated by a partition wall 23 from a sump region 32 of the first rinsing module 5 in order to prevent an exchange of liquid between the sump regions 12 and 32. Schematically illustrated pairs of transport rolls 16 can be coupled directly or indirectly to the material to be treated 8, for example to the longitudinal edges thereof, in order to convey the material to be treated 8 through the treatment region 1 1 of the first active module 2 in the direction of transport 9.

The second active module 3 has a treatment region 17 and a sump region 18. By means of a pump 19, the second process chemical is conveyed from the sump region 18 of the second active module 3 to a distribution arrangement 20 in the treatment region 18. The distribution arrangement 20 for example may comprise a distribution nozzle in order to subject the material to be treated 8 to an incident flow of the second process chemical. By means of back-up means, which may comprise a base 22b of a collection trough and a partitioning arrangement 58 provided between the treatment region 17 of the second active module 3 and a treatment region 51 of the third rinsing module 7, the second process chemical can be backed up in the treatment region 17 of the second active module 3 as far as a level 21 that is higher than the transport plane 10. The sump region 18 of the second active module 3 is separated by a partition wall 24 from a sump region 52 of the third rinsing module 7 in order to prevent an exchange of liquid between the sump regions 18, 52. Schematically illustrated pairs of transport rolls can be coupled directly or indirectly to longitudinal edges of the material to be treated 8 in order to convey the material to be treated 8 through the treatment region 17 of the second active module 3 in the direction of transport 9.

The rinsing arrangement 4 with the plurality of rinsing modules 5-7 is designed as a rinsing cascade, to which a flow 25 of fresh rinsing liquid, for example water, is fed, which has no dirt load or only a low dirt load. A flow 26 of rinsing liquid which contains dirt load from the material to be treated 8 rinsed in the rinsing arrangement 4 is diverted from the rinsing arrangement 4. The flow 25 of fresh rinsing liquid is fed to the rinsing module 7 of the rinsing arrangement 4 arranged last in the direction of transport 9 of the material to be treated. The flow 26 of rinsing liquid with dirt load is diverted from the rinsing module 5 of the rinsing arrangement 4 arranged first in the direction of transport 9 of the material to be treated. In the rinsing arrangement 4, the rinsing liquid is cascaded through the rinsing modules from the rinsing module 7 arranged last in the direction of transport 9 of the material to be treated, against the direction of transport 9 of the material to be treated. In order to cascade the rinsing liquid through the rinsing modules 5-7 against the direction of transport 9 of the material to be treated, overflows can be provided between the sump regions of adjacent rinsing modules. Additionally or alternatively, a flow of the rinsing liquid against the direction of transport 9 of the material to be treated can also be produced between treatment regions of adjacent rinsing modules, as will be explained in greater detail with reference to Figures 3 and 4.

The first rinsing module 5, which is adjacent to the first active module 2, has a treatment region 31 and a sump region 32. By means of a pump 33, the rinsing liquid is conveyed from the sump region 32 to a distribution arrangement 34 in the treatment region 31 . The distribution arrangement 34 for example may comprise a distribution nozzle in order to subject the material to be treated 8 to an incident flow of rinsing liquid. The rinsing liquid in the first treatment module 5 may have a higher concentration of impurities than in the subsequent rinsing modules. By means of back-up means, which may comprise a base 22c of a collection trough, a partitioning arrangement 36 provided between the treatment region 1 1 of the first active module 2 and the treatment region 31 of the first rinsing module 5, and a partitioning arrangement 38 provided between the treatment region 31 of the first rinsing module 5 and a treatment region 41 of the second rinsing module 6, the rinsing liquid can be backed up in the treatment region 31 of the first rinsing module 5 as far as a level 35 that reaches at least up to the transport plane 10. By means of overflow weirs, which allow rinsing liquid 39 from the treatment region 31 to overflow into the sump region 32, or by means of an active level control, the level 35 of the rinsing liquid in the treatment region 31 can be set.

The second rinsing module 6, which is adjacent to the first rinsing module

5 in the direction of transport 9 of the material to be treated, has a treatment region 41 and a sump region 42. By means of a pump 43, the rinsing liquid is conveyed from the sump region 42 to a distribution arrangement 44 in the treatment region 41 , the distribution arrangement 44 possibly having a distribution nozzle, for example. The treatment region 41 is delimited by the partitioning arrangement 38, which is provided between the treatment regions of the first rinsing module 5 and of the second rinsing module 6, and by a partitioning arrangement 48, which is provided between the treatment regions of the second rinsing module 6 and of the third rinsing module 7. In the region defined by the partitioning arrangements 38, 48 and a base 22c of a collection trough, the rinsing liquid can be backed up in the treatment region 41 of the second rinsing module 6 as far as a level 45, which reaches at least up to the transport plane 10. By means of overflow weirs, which allow rinsing liquid 49 from the treatment region 41 to overflow into the sump region 42, or by means of an active level control, the level 45 of the rinsing liquid in the treatment region 41 can be set.

The third rinsing module 7, which is adjacent to the second rinsing module

6 in the direction of transport 9 of the material to be treated, has a treatment region 51 and a sump region 52. By means of a pump 53, the rinsing liquid is conveyed from the sump region 52 to a distribution arrangement 54 in the treatment region 51 , the distribution arrangement 54 possibly having a distribution nozzle, for example. The treatment region 51 is delimited by the partitioning arrangement 48, which is provided between the treatment regions of the second rinsing module 6 and of the third rinsing module 7, and by the partitioning arrangement 58, which is provided between the treatment regions of the third rinsing module 7 and of the second active module 3. In the region defined by the partitioning arrangements 48, 58 and a base 22c of a collection trough, the rinsing liquid can be backed up in the treatment region 51 of the third rinsing module 7 as far as a level 55 that reaches at least up to the transport plane 10. By means of overflow weirs, which allow rinsing liquid 59 from the treatment region 51 to overflow into the sump region 52, or by means of an active level control, the level 55 of the rinsing liquid in the treatment region 51 can be set.

The partitioning arrangements 36, 38, 48 and 58, which separate treatment regions of adjacent modules of the device 1 from one another, are designed such that they each define a gap extending horizontally and transversely to the direction of transport 9 of the material to be treated 8 in order to pass through the material to be treated. To this end, the partitioning arrangement 36 may have a partition wall 23' and a pair 37 of gap- forming elements arranged above the partition wall 23', said elements forming a gap extending transversely to the direction of transport and parallel to the transport plane of the material to be treated 8. The gap-forming elements extend between the treatment region 1 1 of the first active module 2 and the treatment region 31 of the first rinsing module 5 transversely to the direction of transport 9 of the material to be treated. The pair 37 of gap-forming elements can be arranged such that the lower gap-forming element is distanced in at least one portion extending transversely to the direction of transport 9 from the lower face of the material to be treated 8, that is to say the transport plane 10. The pair 37 of gap-forming elements can be arranged such that the upper gap-forming element is distanced in at least one portion extending transversely to the direction of transport 9 from the upper face of the material to be treated 8. The pair 37 of gap- forming elements can be formed as a pair of rolls, in particular as a pair of turned rolls with varying diameter along their longitudinal axis, for example as rolls having a cylindrical body, at the ends of which raised cylindrical portions are located, which are in direct contact with the material to be treated. The partitioning arrangements 38, 48 and 58 can be formed similarly to the partitioning arrangement 36.

The treatment regions of the active modules 2, 3 and of the rinsing modules 5-7 and the transport arrangement of the device 1 are designed such that the transport arrangement of the material to be treated 8 is transferred directly from the treatment region 1 1 of the first active module, in which the first process chemical is backed up, into the treatment region 31 of the first rinsing module 5, in which the rinsing liquid is backed up. The treatment regions of the active modules 2, 3 and of the rinsing modules 5-7 and the transport arrangement of the device 1 are further designed such that the transport arrangement transfers the material to be treated 8 directly from the treatment region 31 of the first rinsing module 5 into the treatment region 41 of the second rinsing module 6. The treatment regions of the active modules 2, 3 and of the rinsing modules 5-7 and the transport arrangement of the device 1 are further designed such that the transport arrangement transfers the material to be treated 8 directly from the treatment region 41 of the second rinsing module 6 into the treatment region 51 of the third rinsing module 7. The treatment regions of the active modules 2, 3 and of the rinsing modules 5-7 and the transport arrangement of the device 1 are further designed such that the transport arrangement transfers the material to be treated 8 directly from the treatment region 51 of the third rinsing module 7 into the treatment region 17 of the second active module 3. Here, the material to be treated is transferred between treatment regions of adjacent treatment modules such that the material to be treated is transferred between the wet regions without passing through a drying region. The material to be treated can be transported such that it is guided only past the pair of gap-forming elements of the corresponding partitioning arrangement provided between the two treatment regions. The treatment regions of the adjacent treatment modules can be arranged here such that a first treatment liquid is waiting directly on one side of the gap-forming element and such that a second treatment liquid is waiting directly on a side of the gap-forming element arranged opposite in the direction of transport. In an exemplary embodiment, the first treatment liquid may be a process chemical and the second treatment liquid may be a rinsing liquid. In a further exemplary embodiment, the first and second treatment liquid may be the rinsing liquid with different concentration of impurities, that is to say introduced process chemicals, as are present in the different rinsing modules of the rinsing cascade.

Since, in the case of the device 1 , the material to be treated 8 is transferred directly between the treatment regions, that is to say the wet regions for treatment of the material to be treated, of adjacent treatment modules, the overall length of the device 1 , in particular the overall length of the rinsing arrangement 4, can be reduced compared to a conventional rinsing cascade, in which a plurality of pairs of squeezing rolls are provided between treatment regions. Furthermore, flexible substrate can be transported reliably.

The partition walls, which are provided between the sump regions 32, 42, 52 of adjacent rinsing modules 5, 6, 7 of the rinsing arrangement 4, are designed in the case of the device 1 such that, between sump regions of adjacent rinsing modules 5, 6, 7, a flow of rinsing liquid from the sump re- gion of a rinsing module flows into the sump region of a rinsing module adjacent thereto against the direction of transport 9 of the material to be treated. In this way, the rinsing liquid can be cascaded through the rinsing modules 5, 6, 7 of the rinsing arrangement against the direction of transport 9 of the material to be treated 8. To this end, an overflow weir 28 or other suitable means can be provided for example on the partition wall between the sump regions 52, 42 of the third rinsing module 7 and of the second rinsing module 6, thus enabling a flow of rinsing liquid from the sump region 52 of the third rinsing module 7 into the sump region 42 of the second rinsing module 6. Similarly, an overflow weir 27 or other suitable means enabling a flow of rinsing liquid from the sump region 42 of the second rinsing module 6 into the sump region 32 of the first rinsing module 5 can be provided on the partition wall between the sump regions 42, 32 of the second rinsing module 6 and of the first rinsing module 5. As will be explained in greater detail with reference to Figures 3 and 4, a flow of rinsing liquid directed against the direction of transport 9 of the material to be treated 8 may also be provided between treatment regions of adjacent rinsing modules.

In order to prevent an exchange of first process chemical and rinsing liquid between the treatment region 1 1 of the first active module 2 and the treatment region 31 of the first rinsing module 5, the means for setting the liquid level 15 in the treatment region 1 1 of the first active module 2 and for setting the liquid level 35 in the treatment region 31 of the first rinsing module 5 can be designed such that a difference in the hydrostatic pressure of the first process chemical and of the rinsing liquid backed up in the treatment regions 31 of the first rinsing module 5 at the gap formed for passing through the material to be treated at the partitioning arrangement 36 is smaller than a threshold value. The threshold value can be selected such that a volume flow rate of first process chemical and rinsing liquid between the treatment region 1 1 of the first active module 2 and the treatment region 31 of the first rinsing module 5 can be less than 100 l/h, in particular less than 10 l/h, in particular less than 1 l/h. Accordingly, the means for setting the liquid level 35 in the treatment region 51 of the third rinsing module 7 and for setting the liquid level 21 in the treatment region 17 of the second active module 3 can be designed such that an exchange of second process chemical and rinsing liquid between the treatment region 17 of the second active module 3 and the treatment region 51 of the third rinsing module 7 is prevented.

Figure 2 is a schematic sectional view of a treatment module. The treatment module may be used, for example, as a first rinsing module 5 of the rinsing arrangement 4 in the device 1 of Figure 1 . Elements, arrangements or regions that correspond in terms of their design and function to elements, arrangements or regions of the treatment module 5 that have already been explained with reference to Figure 1 are provided with the same reference signs.

The sump region 32 of the rinsing module 5 is delimited in the direction of transport by a pair of partition walls 71 , 72. The partition wall 71 provided between the sump region 32 of the rinsing module 5 and the sump region of an adjacent active module prevents an overflow of rinsing liquid and process chemical between the sump regions. The partition wall 72 provided between the sump region 32 of the rinsing module 5 and an adjacent rinsing module of a rinsing cascade is designed such that a flow 74 of rinsing liquid from the adjacent rinsing module can overflow into the sump region 32 of the rinsing module 5. A liquid level 73 is set in the sump region 32. The treatment region 31 of the rinsing module 5 is delimited in the direction of transport by a pair of partitioning arrangements 36, 38. The partitioning arrangement 36 has a wall portion 65 and a pair of gap-forming elements 62, 63 provided thereabove. The pair of gap-forming elements 62, 63 for example may comprise a pair of rolls, in particular a pair of turned rolls with varying diameter along their longitudinal axis. The pair of gap-forming elements 62, 63 delimits a gap 64 for passing through the material to be treated. The partitioning arrangement 38 has wall portion 69 and a pair of gap-forming elements 66, 67 provided thereabove. The pair of gap-forming elements 66, 67 for example may comprise a pair of rolls, in particular a pair of turned rolls with varying diameter along their longitudinal axis. The pair of gap-forming elements 66, 67 delimits a gap 68 for passing through the material to be treated.

The rinsing module 5 is designed in such a way that a distance between the partition walls 65, 68 delimiting the treatment region 31 in the direction of transport is substantially equal to the distance between the partition walls 71 , 72 delimiting the sump region 32 in the direction of transport, said distance defining the length of the rinsing module 5. The rinsing liquid is therefore backed up in the treatment region 31 of the rinsing module over a length that corresponds substantially to the length of the rinsing module 5. With use of a plurality of rinsing modules in a rinsing cascade, the treatment region 31 of the rinsing module extending over the entire length of the rinsing module, an overall length of the rinsing cascade can be reduced compared to a conventional rinsing cascade.

With use of the rinsing module 5 in a horizontal pass-through system, a flow of liquid through the gap 64 of the partitioning arrangement 36, through which the material to be treated is transferred between the rinsing module 5 and an adjacent active module, can be prevented, such that it is smaller than a predefined threshold value. Additionally, a flow of rinsing liquid through the gap 68 of the partitioning arrangement 38, through which the material to be treated is transferred between the rinsing module 5 and an adjacent rinsing module of a rinsing cascade, can be set such that a desired, finite volume flow rate of rinsing liquid flows through the gap 69 against the direction of transport 9 of the material to be treated. The prevention of a flow through the gap 64 and/or the setting of a desired net flow of rinsing liquid through the gap 68 can be attained by a suitable design of the distribution arrangement 34 of the rinsing module. Alternatively or additionally, means for setting liquid levels can be provided, as will be explained in greater detail hereinafter with reference to Figures 3 and 4.

Figure 3 is a schematic sectional view of a device 81 for treating flat material to be treated 8, which for example may be a circuit board, conductor film or the like. Elements, arrangements or regions of the device 81 that correspond in terms of their design and function to elements, arrangements or regions of the device 1 that have already been explained with reference to Figure 1 are provided with the same reference signs.

The device 81 comprises a first active module 2 for treating with a first process chemical the material to be treated 8, a second active module 3 for treating with a second process chemical the material to be treated 8, and a rinsing arrangement 84, which is provided between the first active module 2 and the second active module 3 and which is formed with a rinsing cascade having a plurality of rinsing modules 5, 6, 87. A transport arrangement, which for example may comprise pairs of transport rolls 16, transports the material to be treated 8 in a direction of transport 9 through the first active module 2, the rinsing arrangement 84 and the second active module 3, wherein the material to be treated 8 is transported in a horizontal transport plane 10. In the case of the device 81 , at least one of the rinsing modules has a design which allows rinsing liquid to flow between the treatment region of the corresponding rinsing module and a treatment region of an adjacent rinsing module in a direction against the direction of transport, the rinsing liquid flowing through a gap through which the material to be treated is transferred between the treatment regions. In the case of the device 81 , at least one of the rinsing modules has a design which allows an exchange of liquid between the treatment region of the corresponding rinsing module and a treatment region of an adjacent active module to be prevented.

In the case of the device 81 , in particular at least one of the rinsing modules adjacent to an active module, in which the material to be treated is treated with a process chemical, may have a design which allows at least two different liquid levels to be set in the treatment region of the corresponding rinsing module. This rinsing module may be arranged before an active module in the direction of transport.

The rinsing arrangement 84 with the plurality of rinsing modules 5, 6, 87 is designed as a rinsing cascade, the rinsing modules 5 and 6 possibly having the same design as the rinsing modules 5, 6 of the device 1 described with reference to Figure 1 . The third rinsing module 87, which is adjacent to the second rinsing module 6 in the direction of transport 9 of the material to be treated, has a treatment region 91 and a sump region 92. By means of a pump 93, the rinsing liquid from the sump region 92 is conveyed to a distribution arrangement 94 in the treatment region 91 , wherein the distribution arrangement 94 may have a distribution nozzle, for example. The treatment region 91 is delimited by the partitioning arrangement 48, which is provided between the treatment regions of the second rinsing module 6 and of the third rinsing module 87, and by the partitioning ar- rangement 58, which is provided between the treatment regions of the third rinsing module 87 and of the second active module 3. In the region defined by the partitioning arrangements 48, 58 and a base 22c of a collection trough, the rinsing liquid can be backed up in the treatment region 91 of the third rinsing module 7. The partitioning arrangements 48 and 58, as described with reference to Figures 1 and 2, may each have a pair of gap-forming elements, which extend between the treatment region 91 of the third rinsing module 87 and the treatment region 41 of the second rinsing module 6, and between the treatment region 91 of the third rinsing module 87 and the treatment region 17 of the second active module 3, transversely to the direction of transport 9 of the material to be treated.

The rinsing module 87 of the rinsing cascade arranged last in the direction of transport can be designed such that its treatment region has two portions 87a, 87b, which are adjacent in the direction of transport and in which the rinsing liquid can be backed up to different levels. To this end, an arrangement 95 is provided, which extends transversely to the direction of transport in the treatment region 91 of the rinsing module 87. The arrangement 95 may comprise a pair of gap-forming elements, which are arranged such that the lower gap-forming element is distanced in at least one portion extending transversely to the direction of transport 9 from the lower face of the material to be treated 8, that is to say the transport plane 10. The pair of gap-forming elements can be arranged such that the upper gap-forming element is distanced in at least one portion extending transversely to the direction of transport 9 from the upper face of the material to be treated 8. The pair of gap-forming elements may be formed as a pair of rolls, in particular as a pair of turned rolls with varying diameter along their longitudinal axis. The pump 93 conveys rinsing liquid from the sump region 92 of the rinsing module 87 into at least one of the portions 87a, 87b of the treatment region. In particular, the rinsing module 87 can be designed such that the pump 93 conveys rinsing liquid from the sump region 92 into the portion 87a of the portions 87a, 87b arranged upstream in the direction of transport 9 of the material to be treated. If the rinsing module 87 has a distribution arrangement 94 in the treatment region, the distribution arrangement may be provided in the portion 87a of the treatment region first passed by the material to be treated 8 during the transport process. A flow of rinsing liquid can flow from at least one of the portions 87a, 87b back into the sump region 92 of the rinsing module 87, for example via suitably designed overflow weirs. In an exemplary embodiment, a flow 98, 99 of rinsing liquid can flow from each of the portions 87a, 87b back into the sump region 92.

During operation of the device 81 , the liquid level in the portion 87a of the treatment region of the rinsing module 87 passed through first by the material to be treated 8 can be set such that a flow of rinsing liquid directed against the direction of transport 9 of the material to be treated 8 flows from the portion 87a into the treatment region of the adjacent rinsing module 6 through the gap defined by the partitioning arrangement 48 for passing through the material to be treated 8. To this end, a liquid level 96 can be set in the portion 87a that is higher than a liquid level 45 in the treatment region 41 of the rinsing module 6 that is adjacent against the direction of transport 9 of the material to be treated. The rinsing liquid can be backed up in the portion 87a such that it reaches at least as far as the transport plane 10. The liquid levels 45 and 96 can be selected depending on dimensions of the gap, in particular depending on a cross-sectional area of the gap, which is defined by the partitioning arrangement 48 for passing through the material to be treated. In particular, the liquid levels 45 and 96 can be selected such that the net volume flow rate through the gap is smaller than a volume flow rate 25 of fresh water fed from the rinsing cascade.

During operation of the device 81 , the liquid level in the portion 87b of the treatment region of the rinsing module 87 passed through last by the material to be treated 8 can be set such that a volume flow rate of liquids flowing through the gap defined by the partitioning arrangement 58 for passing through the material to be treated 8 is smaller than a desired threshold value, for example smaller than 100 l/h, in particular for example smaller than 10 l/h, in particular for example smaller than 1 l/h. To this end, a liquid level 97 can be set in the portion 87b such that, in the gap designed by the partitioning arrangement 58, a difference between the hydrostatic pressure generated by the rinsing liquid backed up as far as the level 97 and the hydrostatic pressure generated by the second process chemical 17 backed up as far as the level 21 is smaller than a threshold value over the entire height of the gap. The rinsing liquid can be backed up in the portion 87b such that it reaches at least as far as the transport plane 10.

The setting of the levels in the portions 87a, 87b of the rinsing module 87 can be implemented by suitably dimensioned weirs. Alternatively or additionally, an active level control can be provided, which has a sensor for detecting at least one of the levels 96, 97, a volume flow rate conveyed by the pump 93 into the treatment region 91 of the rinsing module 87 being controlled depending on a detected level 96, 97.

The setting of liquid levels in the rinsing cascade 82 will be described in greater detail with reference to Figure 4. In the case of the device 81 , the material to be treated 8 can be transported directly from the treatment region 1 1 of the first active module 2, in which the first process chemical is backed up, into the treatment region 31 of the first rinsing module 5, in which the rinsing liquid is backed up. Here, the material to be treated 8 can be guided through the gap, which is provided in the partitioning arrangement 36 in order to pass through the material to be treated, the first process chemical waiting directly on one side of the partitioning arrangement and the rinsing liquid waiting directly on the other side. Similarly, in the case of the device 81 , the material to be treated 8 can be transported directly from the treatment region 91 of the last rinsing module 87, in which the rinsing liquid is backed up, into the treatment region 17 of the second active module 3, in which the second process chemical is backed up. Here, the material to be treated 8 can be guided through the gap, which is provided in the partitioning arrangement 58 in order to pass through the material to be treated, the rinsing liquid waiting directly on one side of the partitioning arrangement and the second process chemical waiting directly on the other side. Similarly, in the case of the device 81 , the material to be treated 8 can be transferred directly between the treatment regions of adjacent rinsing modules, the material to be treated being guided through the gap of a partitioning arrangement which is provided between the treatment regions and on each side of which rinsing liquid is waiting directly with different concentrations of impurities.

Figure 4 shows a schematic sectional view of a device 81 ' for treating flat material to be treated 8, which for example may be a circuit board, conductor film or the like. Elements, arrangements or regions of the device 81 ' which correspond in terms of their design and function to elements, arrangements or regions of the device 81 that has already been explained with reference to Figure 3 are provided with corresponding reference signs.

The device 81 ' comprises a first active module 2' for treating with a first process chemical the material to be treated 8, a second active module 3' for treating with a second process chemical the material to be treated 8, and a rinsing arrangement 84', which is provided between the first active module 2' and the second active module 3' and which is designed as a rinsing cascade with a plurality of rinsing modules 5', 6', 87'. A transport arrangement transports the material to be treated 8 in a direction of transport 9 through the active module 2', the rinsing arrangement 84' and the second active module 3', the material to be treated 8 being transported in a horizontal transport plane 10. Each of the treatment modules 2', 5', 6', 87' and 3' has a treatment region for the treatment of the material to be treated and also has a sump region, from which the treatment liquid is conveyed into the associated treatment region by means of a conveying arrangement (not illustrated).

The sump region of the first active module 2' is separated by a partition wall from the sump regions of the rinsing modules 5', 6', 87'. The sump region of the second active module 3' is separated by a partition wall from the sump regions of the rinsing modules 5', 6', 87'. A flow 25 of fresh rinsing liquid is fed to the rinsing module 87' arranged last in the direction of transport. A flow 26 of rinsing liquid is diverted from the rinsing module 5' arranged first in the direction of transport and has an impurity concentration. The levels 1 12, 1 13, 1 14 of the rinsing liquid increase in the sump regions of the rinsing modules 5', 6', 87' in the direction of transport 9 of the material to be treated. A flow 1 17, 1 18 of the rinsing liquid directed against the direction of transport of the material to be treated is set between the sump regions of adjacent rinsing modules 5', 6', 87' in order to cascade the rinsing liquid through the rinsing modules against the direction of transport of the material to be treated. The cascading of the rinsing liquid from treatment region to treatment region makes it possible to observe a desired rinsing criterion with moderate consumption of rinsing liquid, for example fresh water, and at the same time to improve the rinsing effect at the material to be treated.

In the treatment regions of the rinsing modules 5', 6', 87', the rinsing liquid is in each case backed up as far as a level that reaches at least as far as the transport plane. The rinsing module 87' arranged last in the direction of transport 9 of the material to be treated is designed such that, in two portions 87a' and 87b' of the treatment region which are arranged adjacently in the direction of transport, the rinsing liquid is backed up to different levels 104, 105. The pressure difference resulting from the different levels 104, 105 in the portions 87a' and 87b' of the treatment region of the third rinsing module 87 leads to a flow 109, directed in the direction of transport 9 of the material to be treated, between the portions 87a' and 87b'.

The levels 102, 103, 104 of the rinsing liquid in the treatment regions of the rinsing modules 5', 6' and 87' rise in the direction of transport of the treatment module from rinsing module to rinsing module as far as the first portion 87a' of the treatment region of the rinsing module 87'. The resultant pressure difference at the gap, which is defined by the partitioning arrangement 38 and through which the material to be treated is transferred from the treatment region of the first rinsing module 5' into the treatment region of the second rinsing module 6', creates a flow 107 of rinsing liquid, directed against the direction of transport 9 of the material to be treated, from the treatment region of the second rinsing module 6' through the gap into the treatment region of the first rinsing module 5'. The resultant pressure difference at the gap, which is defined by the partitioning arrange- ment 48 and through which the material to be treated is transferred from the treatment region of the second rinsing module 6' into the treatment of the third rinsing module 87', creates a flow 108 of rinsing liquid, directed against the direction of transport 9 of the material to be treated, from the treatment region of the third rinsing module 87' through the gap into the treatment region of the second rinsing module 6'. The flows 107, 108 of rinsing liquid through the gaps through which the material to be treated is transported, said flows being directed against the direction of transport 9 of the material to be treated, help to reduce the carry-over of rinsing liquid with higher concentration of impurities from one rinsing module into a rinsing module that is adjacent in the direction of transport. The levels 102- 104 in the treatment regions of rinsing modules can be selected depending on geometric dimensions of the gap through which the material to be treated is transported between the rinsing modules, in particular depending on a cross-sectional area of the gap. The levels 102-104 can be selected such that the volume flow rates of the flows 107 and 108 are smaller than a volume flow rate of the fed fresh water 25.

The level 101 of the first process chemical in the treatment region of the first active module 2' and the level 102 of the rinsing liquid in the treatment region of the first rinsing module 5' are selected such that a volume flow rate through the gap for passing through the material to be treated, said gap being defined by the gap-forming elements 37a, 37b of the partitioning arrangement 36, is smaller than a desired threshold value.

The level 106 of the second process chemical in the treatment region of the second active module 3' and the level 105 of the rinsing liquid in the portion 87b of the treatment region of the third rinsing module 87', which is directly adjacent to the second active module 3', are selected depending on a cross-sectional area of the gap, for example depending on the width of the gap, such that a volume flow rate through the gap for passing through the material to be treated is smaller than a desired threshold value. The threshold value for example may be 100 l/h, 10 l/h or 1 l/h. In particular, it is smaller than or equal to the quantity of fresh water.

The levels in the treatment regions of the treatment modules 2', 5', 6', 87' and 3' can be set by suitably designed weirs. Alternatively or additionally, an active level control can be provided, in which a volume flow rate conveyed from the sump region into the treatment region can be controlled for at least one of the treatment modules depending on a detected level of the treatment liquid in the treatment region.

Although the device 81 ' is illustrated as a device without distribution arrangements in the treatment regions, a distribution arrangement can be provided in at least one of the treatment regions of at least one of the treatment modules 2', 5', 6', 87' and 3', as explained for the device 81 of Figure 3. Alternatively or additionally to the provision of a level cascade in the treatment regions, a flow of rinsing liquid, directed against the direction of transport 9 of the material to be treated, between the treatment regions of different rinsing modules and through the gap through which the material to be treated is transported may then also be set by a suitable design of the distribution arrangements, for example in that the distribution arrangement allows the rinsing liquid to flow out with a speed component directed against the direction of transport 9 of the material to be treated. Similarly, an exchange of liquid between the treatment region of an active module and the treatment region of a rinsing module can also be prevented by a suitable design of the distribution arrangements, alternatively or additionally to the setting of the levels in the treatment regions. Whereas, with reference to Figures 3 and 4, exemplary embodiments for devices 81 , 81 ' have been explained, in which one of the rinsing modules is designed in such a way that different levels are set in two portions of the treatment region of the corresponding rinsing module, said portions being adjacent along the direction of transport, in a further exemplary embodiment an active module may also be designed such that different levels of the backed-up process chemical are set in two portions of its treatment region, said portions being adjacent along the direction of transport. For example, in an exemplary embodiment, the treatment region of the active module 3, 3', into which the material to be treated 8 is transported after passing through the rinsing arrangement 4, 84', may be designed such that, in a portion of the treatment region passed through first by the material to be treated, the process chemical is backed up to a level that is higher than a level in a portion of the treatment region passed through later by the material to be treated.

In the case of devices and methods according to various exemplary embodiments, the material to be treated is transferred between wet regions of at least two treatment modules, without being transported through a drying region therebetween. The devices and methods according to various exemplary embodiments make it possible to provide treatment modules, in particular rinsing modules, of shorter overall length in a pass-through system for the wet-chemical treatment of material to be treated.

The reduction of the overall length of each rinsing module makes it possible, for example with a predefined number of rinsing modules, to reduce the overall length of the device. Alternatively, with a predefined maximum total overall length of a rinsing cascade, the number of rinsing modules can be increased in order to observe a stricter rinsing criterion. Modifications of the exemplary embodiments illustrated in the figures and described in detail can be implemented with other exemplary embodiments.

Whereas in the context of exemplary embodiments a rinsing arrangement having a plurality of rinsing modules, for example three rinsing modules, has been described, another suitable number of rinsing modules can be selected depending on the respective applications. For example, just one rinsing module or just two rinsing modules can be provided between two active modules. In further exemplary embodiments a rinsing cascade having at least four rinsing modules may be provided.

Whereas in the context of exemplary embodiments devices and methods having treatment regions have been described which have a distribution arrangement in order to subject the material to be treated to an incident flow of treatment liquid, in further exemplary embodiments a treatment region or a plurality of treatment regions may be formed without distribution arrangement. Whereas, in the context of exemplary embodiments, treatment modules having treatment regions have been described, in which the treatment liquid is backed up as far as the transport plane, in further exemplary embodiments at least one treatment module may also have a treatment region in which the treatment liquid is not backed up as far as the transport plane or is not backed up at all.

Whereas, in the context of exemplary embodiments, devices and methods have been described in which material to be treated is covered permanently with liquid during transportation through a first active module, a rinsing arrangement and a second active module, in a further exemplary embodiment at least one treatment module can be formed such that the treatment liquid is brought into contact only with one side, in particular the lower face, of the material to be treated.

The devices and methods according to the various exemplary embodi- ments can be used for example in the production of circuit boards, such as printed circuit boards, without their use being limited thereto. The devices and methods according to the various exemplary embodiments can be used in particular to treat thin conductor foils having low inherent stability or to treat material to be treated that has a sensitive surface.

List of reference signs

1 treatment device

2, 3 active module

4 rinsing arrangement

5-7 rinsing module

8 material to be treated

9 direction of transport

10 transport plane

1 1 treatment region

12 sump region

13 pump

14 distribution arrangement

15 liquid level

16 pair of transport rolls

17 treatment region

18 sump region

19 pump

20 distribution arrangement

21 liquid level

22a, 22b, 22c base

23, 23', 24 partition wall

25, 26 flow of rinsing liquid

27, 28 overflow weir

31 , 41 , 51 treatment region

32, 42, 52 sump region

33, 43, 53 pump

34, 44, 54 distribution arrangement

35, 45, 55 liquid level

36 partitioning arrangement 7 pair of rolls

8, 48, 58 partitioning arrangement9, 49, 59 flow of rinsing liquid

6 partitioning arrangement2, 63 gap-forming element

4 gap

5 wall portion

6, 67 gap-forming element

9 gap

8 wall portion

1 , 72 partition wall

3 liquid level

1 treatment device

4 rinsing arrangement

7 rinsing module

7a, 87b portions of the treatment region1 treatment region

2 sump region

3 pump

4 distribution arrangement5 pair of rolls

6, 97 liquid level

8, 99 flow of rinsing liquid

1 ' treatment device

', 3' active module

4' rinsing arrangement

7' rinsing module

7a', 87b' portions of the treatment region01 -106 liquid level

07-109 flow of rinsing liquid -1 14 liquid level

, 1 18 flow of rinsing liquid

rinsing cascade

-127 rinsing module

treatment region sump region

pump

distribution arrangement liquid level, 138 partitioning arrangement base

-146 rolls

treatment region

, 153 rolls

treatment region

, 156 rolls

-163 liquid level

, 165 flow of rinsing liquid, 167 flow of rinsing liquid