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Patent Searching and Data


Title:
DEVICE FOR PROCESSING PERFLUORO COMPOUNDS AND METHOD FOR PROCESSING PERFLUORO COMPOUNDS
Document Type and Number:
WIPO Patent Application WO/2014/129050
Kind Code:
A1
Abstract:
This device (2) for processing perfluoro compounds is provided with: a first heater (221) that heats water and a device entrance exhaust gas that is an etching exhaust gas; a second heater (222) that further heats the water and the device entrance exhaust gas and that generates decomposition gas containing an acidic gas by means of hydrolysis of a perfluoro compound by means of a catalyst; a heat exchanger (231) that exchanges heat between the device entrance exhaust gas and the decomposition gas; and an acid component elimination device (232) that performs dry elimination of the acid component from the decomposition gas. The first heater (221), second heater (222), heat exchanger (231), and acid component elimination device (232) are disposed along any of the sides of a rectangular region and within the rectangular region when seen from above, the device entrance exhaust gas and a discharge gas are respectively led in from and discharged from one of the short sides of the rectangular region, and the second heater (222) is disposed at the other short side of the rectangular region.

Inventors:
TORISU JUNICHI (JP)
HAYASAKA YUJI (JP)
ONODERA MASANAO (JP)
Application Number:
JP2013/083214
Publication Date:
August 28, 2014
Filing Date:
December 11, 2013
Export Citation:
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Assignee:
SHOWA DENKO KK (?1058518, JP)
International Classes:
B01D53/86; B01D53/68; H01L21/3065
Foreign References:
JP2003340239A2003-12-02
JPH1170322A1999-03-16
JP2010179223A2010-08-19
JP2002336651A2002-11-26
JPH10263357A1998-10-06
Attorney, Agent or Firm:
FURUBE, Jiro et al. (?1076022, JP)
Jiro Furube (?1076022, JP)
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