Title:
DEVICE FOR TREATING SUBSTRATE AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE
Document Type and Number:
WIPO Patent Application WO/2012/011423
Kind Code:
A1
Abstract:
Disclosed is a device for treating a substrate, which comprises: a treatment chamber which treats a substrate inside a body to be induction heated; a substrate holding body which vertically holds a plurality of substrates inside the treatment chamber in such a way that gaps are formed therebetween; a first heat exchange part which supports the substrate holding body from underneath the substrate holding body inside the treatment chamber and exchanges heat with gas inside the treatment chamber; a second heat exchange part which is disposed horizontally with respect to the first heat exchange part inside the treatment chamber with a gap formed between the first and second heat exchange parts and which exchanges heat with the gas inside the treatment chamber; and an induction heating part which performs, outside of the body to be induction heated, induction heating of the body to be induction heated.
Inventors:
SAIDO Shuhei (C/O HITACHI KOKUSAI ELECTRIC INC. 1, Yasuuchi 2-chome Yatsuo-machi, Toyama-sh, Toyama 93, 〒9392393, JP)
西堂 周平 (〒93 富山県富山市八尾町保内二丁目１番地 株式会社日立国際電気内 Toyama, 〒9392393, JP)
YAMAGUCHI Takatomo (C/O HITACHI KOKUSAI ELECTRIC INC. 1, Yasuuchi 2-chome Yatsuo-machi, Toyama-sh, Toyama 93, 〒9392393, JP)
西堂 周平 (〒93 富山県富山市八尾町保内二丁目１番地 株式会社日立国際電気内 Toyama, 〒9392393, JP)
YAMAGUCHI Takatomo (C/O HITACHI KOKUSAI ELECTRIC INC. 1, Yasuuchi 2-chome Yatsuo-machi, Toyama-sh, Toyama 93, 〒9392393, JP)
Application Number:
JP2011/066041
Publication Date:
January 26, 2012
Filing Date:
July 14, 2011
Export Citation:
Assignee:
HITACHI KOKUSAI ELECTRIC INC. (14-1, Sotokanda 4-chome Chiyoda-k, Tokyo 80, 〒1018980, JP)
株式会社日立国際電気 (〒80 東京都千代田区外神田四丁目１４番１号 Tokyo, 〒1018980, JP)
SAIDO Shuhei (C/O HITACHI KOKUSAI ELECTRIC INC. 1, Yasuuchi 2-chome Yatsuo-machi, Toyama-sh, Toyama 93, 〒9392393, JP)
西堂 周平 (〒93 富山県富山市八尾町保内二丁目１番地 株式会社日立国際電気内 Toyama, 〒9392393, JP)
株式会社日立国際電気 (〒80 東京都千代田区外神田四丁目１４番１号 Tokyo, 〒1018980, JP)
SAIDO Shuhei (C/O HITACHI KOKUSAI ELECTRIC INC. 1, Yasuuchi 2-chome Yatsuo-machi, Toyama-sh, Toyama 93, 〒9392393, JP)
西堂 周平 (〒93 富山県富山市八尾町保内二丁目１番地 株式会社日立国際電気内 Toyama, 〒9392393, JP)
International Classes:
H01L21/205; C23C16/46
Attorney, Agent or Firm:
YUI Tohru et al. (21 TOWA BLDG. 3F, 6-1 Iidabashi 4-chome, Chiyoda-k, Tokyo 72, 〒1020072, JP)
Claims: