DEWATERING METHOD FOR GAS SUPPLY SYSTEMS

Title:

DEWATERING METHOD FOR GAS SUPPLY SYSTEMS

Document Type and Number:

WIPO Patent Application WO/2001/020221

Kind Code:

A1

Abstract:

A dewatering method for gas supply systems which is adapted for effective removal of adsorbed water by ordinary-temperature exhaust processing without using the baking method. The dewatering method for gas supply systems which remove water remaining inside a gas supply system by passing a dewatering gas through the gas supply system, characterized in that the dewatering gas flow pressure is set at values which are above a minimum pressure at which the gas flow becomes a viscous flow but which are below the saturated vapor pressure of water at the dewatering gas flow temperature. The condition under which the dewatering gas becomes a viscous flow is determined by the mean free path of gas molecules becoming smaller than the diameter of the piping for the gas supply system. If the dewatering gas is exhausted at ordinary temperature under such condition, the adsorbed water on the inner surface of the piping or in the valve filter can be effectively removed.

Inventors:

IKEDA NOBUKAZU (JP)
MORIMOTO AKIHIRO (JP)
MINAMI YUKIO (JP)
HONIDEN TERUO (JP)
KAWADA KOUJI (JP)
KOMEHANA KATUNORI (JP)
HIRAI TOURU (JP)
YAMAJI MICHIO (JP)

Application Number:

PCT/JP2000/006209

Publication Date:

March 22, 2001

Filing Date:

September 11, 2000

Export Citation:

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Assignee:

FUJIKIN KK (JP)
IKEDA NOBUKAZU (JP)
MORIMOTO AKIHIRO (JP)
MINAMI YUKIO (JP)
HONIDEN TERUO (JP)
KAWADA KOUJI (JP)
KOMEHANA KATUNORI (JP)
HIRAI TOURU (JP)
YAMAJI MICHIO (JP)

International Classes:

B01D53/26; F17D1/04; F17D3/14; (IPC1-7): F17D1/04; F17D3/14

Foreign References:

JPH10128024A	1998-05-19
JPH07312344A	1995-11-28

Other References: