DIAGNOSTIC METHOD AND APPARATUS FOR NON-INVASIVE PLASMA PROCESS - THE INDUSTRY&ACADEMIC COOPERATION IN CHUNGNAM NATIONAL UNIV

Title:

DIAGNOSTIC METHOD AND APPARATUS FOR NON-INVASIVE PLASMA PROCESS

Document Type and Number:

WIPO Patent Application WO/2021/080089

Kind Code:

A1

Abstract:

The present invention relates to a diagnostic method and apparatus for a non-invasive plasma process capable of monitoring a plasma process in real time by measuring a surface wave resonance frequency generated in a plasma-sheath on the basis of the surface wave resonance principle. The diagnostic method for a non-invasive plasma process, according to the present invention, may comprise: a step of installing at least one probe on one side of an electrostatic chuck (ESC) or on an inner wall of a chamber (S10); a step of projecting a high frequency onto plasma or a sheath by means of the probe (S20); and a step in which the probe detects a frequency reflected from the plasma or the sheath (S30). In addition, the diagnostic method for a non-invasive plasma process may comprise the steps of: extracting a reflectance spectrum according to frequency by using the frequency detected by the probe (S40); extracting a surface wave resonance frequency of the plasma-sheath by using the frequency detected by the probe or the reflectance spectrum (S50); and extracting electron density or uniformity of the plasma on the basis of the surface wave resonance frequency (S60).

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Inventors:

YOU SHINJAE (KR)
LEE SANGHO (KR)
KIM SIJUN (KR)
LEE JANGJAE (KR)
LEE YEONGSEOK (KR)
KIM JUNGHYENG (KR)

Application Number:

PCT/KR2020/000321

Publication Date:

April 29, 2021

Filing Date:

January 08, 2020

Export Citation:

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Assignee:

THE INDUSTRY&ACADEMIC COOPERATION IN CHUNGNAM NATIONAL UNIV (KR)

International Classes:

H01J37/32; H05H1/00

Foreign References:

KR20170028094A	2017-03-13
JP2010232110A	2010-10-14
KR20060067957A	2006-06-20
JP2017069212A	2017-04-06
JP4679364B2	2011-04-27

Attorney, Agent or Firm:

LEE, Un Cheol (KR)

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