Title:
DIARYLAMINE NOVOLAC RESIN
Document Type and Number:
WIPO Patent Application WO/2013/047516
Kind Code:
A1
Abstract:
[Problem] To provide a novel diarylamine novolac resin, such as phenyl naphthylamine novola resin, and to provide a composition for forming a resist underlayer film for use in a lithography process for a semiconductor device using the above resin. [Solution] A polymer including a structural unit (A) represented by formula (1) (in formula (1), Ar1 and Ar2 represent a benzene ring and a naphthalene ring respectively). A manufacturing method for a semiconductor device, the method including: a step for forming an underlayer film on a semiconductor substrate by means of a composition for forming a resist underlayer film; a step for forming a hard mask on the film; a step for forming a resist film on the hard mask; a step for forming a resist pattern by means of irradiation and development via light or electron beams; a step for etching the hard mask by means of the resist pattern; a step for etching the underlayer film by means of the patterned hard mask; and a step for finishing the semiconductor substrate by means of the patterned underlayer film.
Inventors:
SAKAMOTO RIKIMARU (JP)
SOMEYA YASUNOBU (JP)
HASHIMOTO KEISUKE (JP)
NISHIMAKI HIROKAZU (JP)
SOMEYA YASUNOBU (JP)
HASHIMOTO KEISUKE (JP)
NISHIMAKI HIROKAZU (JP)
Application Number:
PCT/JP2012/074551
Publication Date:
April 04, 2013
Filing Date:
September 25, 2012
Export Citation:
Assignee:
NISSAN CHEMICAL IND LTD (JP)
International Classes:
C08G16/02; G03F7/11; H01L21/027
Domestic Patent References:
| WO2010147155A1 | 2010-12-23 | |||
| WO2011065395A1 | 2011-06-03 |
Foreign References:
| JPH1187065A | 1999-03-30 | |||
| JPS60186532A | 1985-09-24 | |||
| JPS60220931A | 1985-11-05 | |||
| JPH02111948A | 1990-04-24 |
Attorney, Agent or Firm:
HANABUSA, Tsuneo et al. (JP)
Sepal Tsuneo (JP)
Sepal Tsuneo (JP)
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Claims:
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