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Title:
DIELECTRIC CONSTANT MEASUREMENT METHOD
Document Type and Number:
WIPO Patent Application WO/2022/153490
Kind Code:
A1
Abstract:
One embodiment of the present invention is a dielectric constant measurement method having: a step for performing calibration; a step for calculating a theoretical error component of an admittance yi, with respect to the actual value of the admittance yi; a step for measuring, with a measurement device, the dielectric constant of a substance being measured; a step for calculating, on the basis of the measurement result for the dielectric constant of the substance being measured, the actual value of the admittance ym of the end surface of a probe of the measurement device; a step for correcting the actual value of the admittance ym of the end surface of the probe by using the error component; and a step for calculating the dielectric constant of the substance being measured by substituting the corrected actual value of the admittance ym for the theoretical value of admittance ym in a model formula that expresses the relationship between the theoretical admittance ym and the dielectric constant of the substance being measured.

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Inventors:
NAKAMURA MASAHITO (JP)
TAJIMA TAKURO (JP)
SEYAMA MICHIKO (JP)
Application Number:
PCT/JP2021/001303
Publication Date:
July 21, 2022
Filing Date:
January 15, 2021
Export Citation:
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Assignee:
NIPPON TELEGRAPH & TELEPHONE (JP)
International Classes:
G01N22/00; G01R27/26
Foreign References:
JP2011047856A2011-03-10
JP2007263625A2007-10-11
US6472885B12002-10-29
US20100064820A12010-03-18
Other References:
JULRAT, SAKOL: "Open-ended coplanar waveguide sensor for dielectric permittivity measurement", PROCEEDINGS OF IEEE INSTRUMENTATION AND MEASUREMENT TECHNOLOGY CONFERENCE, 2018, pages 1 - 5, XP033374386, DOI: 10.1109/I2MTC.2018.8409843
MARTENS, H.C.F.: "Measurement of the complex dielectric constant down to helium temperatures. I. Reflection method from 1 MHz to 20 GHz using an open ended coaxial line", REVIEW OF SCIENTIFIC INSTRUMENTS, vol. 71, no. 2, 2000, pages 473 - 477, XP012038000, DOI: 10.1063/1.1150226
Attorney, Agent or Firm:
SHIGA INTERNATIONAL PATENT OFFICE (JP)
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