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Title:
DIFFRACTION GRATING MANUFACTURING METHOD, SPECTROPHOTOMETER, AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD
Document Type and Number:
WIPO Patent Application WO/2012/157697
Kind Code:
A1
Abstract:
The purpose of the present invention is to provide a technique for manufacturing a diffraction grating which is ideal for use in a spectrophotometer, has an apex angle in a protuberance of approximately 90 degrees, and has a high diffraction efficiency and a low quantity of stray light. A manufacturing method for a diffraction grating, said method being characterised in that exposure is carried out under exposure conditions set such that the cross-sectional shape of a protuberance in a resist on a substrate, formed by means of exposure, is an asymmetric triangle and the angle formed by the long and short sides of the triangle shape relative to the shape of an opening section in a mask having opening sections in a periodic structure is approximately 90 degrees.

Inventors:
EBATA YOSHISADA (JP)
MATSUI SHIGERU (JP)
HASEGAWA NORIO (JP)
KAKUTA KAZUYUKI (JP)
ONOZUKA TOSHIHIKO (JP)
Application Number:
PCT/JP2012/062622
Publication Date:
November 22, 2012
Filing Date:
May 17, 2012
Export Citation:
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Assignee:
HITACHI LTD (JP)
HITACHI HIGH TECH CORP (JP)
EBATA YOSHISADA (JP)
MATSUI SHIGERU (JP)
HASEGAWA NORIO (JP)
KAKUTA KAZUYUKI (JP)
ONOZUKA TOSHIHIKO (JP)
International Classes:
G02B5/18; G01J3/18; G03F1/00; G03F7/20; H01L21/027
Foreign References:
JPH06186412A1994-07-08
JPH1073724A1998-03-17
JP2004086073A2004-03-18
JP2005121938A2005-05-12
JP2007147926A2007-06-14
JPH0798404A1995-04-11
JP2005157118A2005-06-16
JPH10113780A1998-05-06
JP2005011478A2005-01-13
JP2006259325A2006-09-28
JPH11305023A1999-11-05
JP2007155927A2007-06-21
JP2002189112A2002-07-05
Other References:
KEIEI KUDO: "BASE AND METHOD of SPECTRUM", July 1985, OHMSHA LTD
Attorney, Agent or Firm:
TSUTSUI, YAMATO (JP)
Tsutsui Daiwa (JP)
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