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Title:
DIFFRACTION OPTICAL ELEMENT, OPTICAL IRRADIATION DEVICE, AND IRRADIATION PATTERN READING METHOD
Document Type and Number:
WIPO Patent Application WO/2019/009260
Kind Code:
A1
Abstract:
Provided are a diffraction optical element, an optical irradiation device, and an irradiation pattern reading method with which a step in an irradiation pattern can be made less visible, and which, when performing reading, enables more accurate reading. A diffraction optical element 110 comprises rectangular unit cells 10 which are formed with a plurality of diffraction gratings and configured to obtain specific light distribution characteristics. The diffraction gratings of the unit cells 10 are configured such that light that has passed through the diffraction optical element 110 forms an irradiation pattern comprising a combination of a plurality of dots having different amounts of irradiation light.

Inventors:
INAZUKI Yuichi (1-1-1, Ichigaya Kagacho, Shinjuku-k, Tokyo 01, 〒1628001, JP)
HORIGUCHI Ryuji (1-1-1, Ichigaya Kagacho, Shinjuku-k, Tokyo 01, 〒1628001, JP)
OOYAGI Yasuyuki (1-1-1, Ichigaya Kagacho, Shinjuku-k, Tokyo 01, 〒1628001, JP)
YOSHIOKA Hidenori (1-1-1, Ichigaya Kagacho, Shinjuku-k, Tokyo 01, 〒1628001, JP)
TOYAMA Nobuhito (1-1-1, Ichigaya Kagacho, Shinjuku-k, Tokyo 01, 〒1628001, JP)
Application Number:
JP2018/025105
Publication Date:
January 10, 2019
Filing Date:
July 02, 2018
Export Citation:
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Assignee:
DAI NIPPON PRINTING CO., LTD. (1-1-1, Ichigaya Kagacho Shinjuku-k, Tokyo 01, 〒1628001, JP)
International Classes:
F21S2/00; F21V5/00; G02B5/18
Domestic Patent References:
WO2017090274A12017-06-01
Foreign References:
JP2001116908A2001-04-27
JP2010539649A2010-12-16
JP2002107522A2002-04-10
Attorney, Agent or Firm:
SHOBAYASHI Masayuki et al. (Sapia Tower, 1-7-12 Marunouchi, Chiyoda-k, Tokyo 05, 〒1000005, JP)
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