Title:
DIGITAL MICROMIRROR ARRAY-BASED ULTRAVIOLET EXPOSURE MACHINE AND CONTROL METHOD THEREFOR
Document Type and Number:
WIPO Patent Application WO/2018/014361
Kind Code:
A1
Abstract:
A digital micromirror array-based ultraviolet exposure machine and a control method therefor, the ultraviolet exposure machine comprising a digital micromirror array (1) and a light source (3); an illumination optical device (4) is arranged between the digital micromirror array (1) and the light source (3), wherein a front-group optical device (5) and a portrait dividing device (6) are arranged between the digital micromirror array (1) and an imaging surface (2); light emitted by the light source (3) passes through the illumination optical device (4) and reaches the digital micromirror array (1); after passing through the front-group optical device (5), reflected light is divided by the portrait dividing device (6) into multiple groups of rays in different directions, and then the rays form an image having a certain displacement on the imaging surface (2) after passing through respective optical systems. Thus, a part of the digital micromirror array (1) which has not been used may be imaged after being translated in a direction intersecting with a scanning direction, thereby increasing photolithography width, achieving large-area single scanning exposure and improving work efficiency.
Inventors:
MA YINGAO (CN)
Application Number:
PCT/CN2016/091514
Publication Date:
January 25, 2018
Filing Date:
July 25, 2016
Export Citation:
Assignee:
MA YINGAO (CN)
International Classes:
G03F7/20
Foreign References:
| JP2014092707A | 2014-05-19 | |||
| JP5881313B2 | 2016-03-09 | |||
| JP2009087995A | 2009-04-23 | |||
| JP2005321676A | 2005-11-17 | |||
| US20100208222A1 | 2010-08-19 | |||
| CN101364050A | 2009-02-11 | |||
| CN101144984A | 2008-03-19 |
Attorney, Agent or Firm:
SHANGHAI KELV PATENT AGENCY,LLP (CN)
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