Title:
DILUTE CHEMICAL SOLUTION-PRODUCING APPARATUS AND DILUTE CHEMICAL SOLUTION-PRODUCING METHOD
Document Type and Number:
WIPO Patent Application WO/2018/055801
Kind Code:
A1
Abstract:
A dilute chemical solution-producing apparatus has a configuration wherein a supply line 1 for ultrapure water W is provided with a platinum group metal-loaded resin column 2, a membrane-type deaeration device 3 and a gas-dissolving membrane device 4, and between the platinum group metal-loaded resin column 2 and the membrane-type deaeration device 3, a device 5 for injecting a cleaning chemical solution is provided. An inert gas source 6 is connected on the gas phase-side of the membrane-type deaeration device 3, and an inert gas source 7 is also connected on the gas phase-side of the gas-dissolving membrane device 4. A discharge line 8 is in communication with the gas-dissolving membrane device 4. Using said dilute chemical solution-producing apparatus, it is possible to safely produce and supply a dilute chemical solution, in which both dissolved oxygen and dissolved hydrogen peroxide have been removed, in a cleaning step during semiconductor cleaning.
Inventors:
FUJIMURA YU (JP)
GAN NOBUKO (JP)
TOKOSHIMA HIROTO (JP)
GAN NOBUKO (JP)
TOKOSHIMA HIROTO (JP)
Application Number:
PCT/JP2017/010275
Publication Date:
March 29, 2018
Filing Date:
March 14, 2017
Export Citation:
Assignee:
KURITA WATER IND LTD (JP)
International Classes:
C02F1/68; B01D19/00; B01F1/00; B01F5/06; B01J23/42; B08B3/08; C02F1/20; C02F1/58; H01L21/304
Domestic Patent References:
| WO2015189933A1 | 2015-12-17 |
Foreign References:
| JP2004340304A | 2004-12-02 | |||
| JP2010069460A | 2010-04-02 | |||
| JPH04176303A | 1992-06-24 | |||
| JP2003062403A | 2003-03-04 | |||
| JP2002307080A | 2002-10-22 | |||
| JP2015088740A | 2015-05-07 | |||
| JP2000208471A | 2000-07-28 | |||
| JP2011036807A | 2011-02-24 |
Attorney, Agent or Firm:
HAYAKAWA Yuzi et al. (JP)
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