DIPPING COPOLYMER LATEX

WIPO Patent Application WO/2005/012375

A1

The invention provides products of dipping which are excellent in organic solvent resistance and hand and exhibit satisfactory tensile strength and excellent retention of tight adhesion; dipping compositions capable of forming such products; and a dipping copolymer latex suitable for the dipping compositions. A carboxylated acrylonitrile/butadiene copolymer latex which is produced by the copolymerization of a monomer mixture consisting of 1,3-butadiene, acrylonitrile, and methacrylic acid at a specific ratio wherein part of the acrylonitrile and part of the methacrylic acid are added to the polymerization system at a specified time after the initiation of polymerization and in which the copolymer has a content of matter insoluble in methyl ethyl ketone falling within a specific range; and dipping compositions each comprising the latex, a vulcanizing agent, and a vulcanization accelerator.

Ota, Hisanori c/o ZEON CORPORATION (6-1 Marunouchi 2-chom, Chiyoda-ku Tokyo 23, 10083, JP)
Aihara, Shunjin c/o ZEON CORPORATION (6-1 Marunouchi 2-chom, Chiyoda-ku Tokyo 23, 10083, JP)

PCT/JP2004/011194

February 10, 2005

July 29, 2004

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ZEON CORPORATION (6-1 Marunouchi 2-chome, Chiyoda-ku, Tokyo 23, 10083, JP)
Ota, Hisanori c/o ZEON CORPORATION (6-1 Marunouchi 2-chom, Chiyoda-ku Tokyo 23, 10083, JP)
Aihara, Shunjin c/o ZEON CORPORATION (6-1 Marunouchi 2-chom, Chiyoda-ku Tokyo 23, 10083, JP)

B29C41/00; B29C41/14; C08F2/22; C08F236/16; C08L13/02; (IPC1-7): C08F236/12; C08L9/04; C08F2/22; B29C41/14

Yamashita, Akihiko c/o Tokyo, Central Patent Firm (4th Floor Oak Building Kyobashi, 16-10, Kyobashi 1-chom, Chuou-ku Tokyo 31, 10400, JP)

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