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Title:
DOUBLE-SIDED PATTERNING METHOD AND PATTERNED ARTICLE
Document Type and Number:
WIPO Patent Application WO/2019/159969
Kind Code:
A1
Abstract:
A purpose of the present invention is to form a pattern on two sides of a patterning workpiece 1 by a double-sided patterning method for forming a pattern on two sides of a patterning workpiece 1 having a first side 11 and a second side 12. The double-sided patterning method has a first protective film-forming step of forming a first protective film 2 on a first pattern 110 formed on the first side 11, and, subsequent to the first protective film-forming step, a second patterning step of forming a second pattern 120 on the second side 12. Another purpose is to fabricate a patterned article by removing the first protective film 2 in a subsequent first protective film removal step.

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Inventors:
TANIGUCHI YUTAKA (JP)
TANAKA SATORU (JP)
Application Number:
PCT/JP2019/005110
Publication Date:
August 22, 2019
Filing Date:
February 13, 2019
Export Citation:
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Assignee:
SCIVAX CORP (JP)
International Classes:
H01L21/027; B29C59/02
Foreign References:
JP2013232252A2013-11-14
JP2006240275A2006-09-14
JP2016212358A2016-12-15
US20150364432A12015-12-17
Attorney, Agent or Firm:
OKUDA Noritsugu (JP)
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