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Patent Searching and Data


Title:
DRAWING SYSTEM AND DRAWING METHOD
Document Type and Number:
WIPO Patent Application WO/2022/210970
Kind Code:
A1
Abstract:
A drawing system according to one embodiment of the present invention comprises a light source unit and a scanning unit. The light source unit generates multiple laser beams including wavelengths that are different from each other and that correspond to absorption wavelengths of a photothermal converter contained in a recording medium. The scanning unit scans the laser beams over the surface of the recording medium in a state in which spots irradiated by the multiple laser beams are lined up at a predetermined spacing in a direction orthogonal to or obliquely intersecting the directions in which the laser beams are scanned.

Inventors:
TAKAHASHI ISAO (JP)
ASAOKA SATOKO (JP)
HOSHI MITSUNARI (JP)
TAKADA MASAHIRO (JP)
TAKEUCHI TAICHI (JP)
KURIHARA KENICHI (JP)
TEJIMA AYA (JP)
Application Number:
PCT/JP2022/016287
Publication Date:
October 06, 2022
Filing Date:
March 30, 2022
Export Citation:
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Assignee:
SONY GROUP CORP (JP)
International Classes:
B41J2/47; B41J2/475; B41M5/28; B41M5/323; B41M5/333; B41M5/337; B41M5/40; B41M5/42; B41M5/46
Domestic Patent References:
WO2020090402A12020-05-07
Foreign References:
JP2004249540A2004-09-09
JP2019055515A2019-04-11
JP2005144952A2005-06-09
JP2005138558A2005-06-02
JP2004322492A2004-11-18
JPH0958025A1997-03-04
US20140160221A12014-06-12
JP2004188827A2004-07-08
JP2021061778A2021-04-22
Attorney, Agent or Firm:
TSUBASA PATENT PROFESSIONAL CORPORATION (JP)
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