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Patent Searching and Data


Title:
DRY CLEANING APPARATUS USING PLASMA AND STEAM
Document Type and Number:
WIPO Patent Application WO/2020/235822
Kind Code:
A1
Abstract:
A dry cleaning apparatus using plasma and steam, according to the present invention, comprises: a chamber having an upper supply port formed on an upper surface part thereof, having a discharge port formed on a lower surface part thereof, having a side supply port formed on a side surface part thereof, and providing a cleaning space; a chuck which is coupled to the lower surface part of the chamber, and on which a monocrystalline silicon substrate including amorphous silicon, polycrystalline silicon, silicon oxide, or silicon nitride is arranged; an RF electrode which is coupled to the upper surface part of the chamber, and to which RF power is applied; an upper shower head which is coupled to the RF electrode so as to communicate with the upper supply port formed on the upper surface part of the chamber, and which has a plurality of upper spray holes formed thereon; a lower shower head, which is coupled to the side surface part of the chamber, has a plurality of first lower spray holes, has a plurality of second lower spray holes that allow communicating with the side supply port, formed thereon and are electrically grounded; a reaction gas supply unit for supplying reaction gas through the upper supply port formed on the upper surface part of the chamber; and a stem supply unit for supplying hot steam through the side supply port formed on the side surface part of the chamber.

Inventors:
LEE GIL GWANG (KR)
LIM DOO HO (KR)
OH SANG RYONG (KR)
PARK JAE YANG (KR)
Application Number:
PCT/KR2020/005422
Publication Date:
November 26, 2020
Filing Date:
April 24, 2020
Export Citation:
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Assignee:
MUJIN ELECTRONICS CO LTD (KR)
International Classes:
H01L21/67; H01J37/32; H01L21/02; H05H1/46
Foreign References:
KR20190032033A2019-03-27
JP2010225847A2010-10-07
KR20080090026A2008-10-08
KR20150109288A2015-10-01
KR20070044081A2007-04-27
Attorney, Agent or Firm:
DARAE LAW & IP, LLC (KR)
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