Title:
DRY ETCHING MACHINE AND GATHERING DEVICE FOR GATHERING MAGNETIC PARTICLES IN GAS
Document Type and Number:
WIPO Patent Application WO/2016/106845
Kind Code:
A1
Abstract:
A dry etching machine and a gathering device for gathering magnetic particles in gas. The dry etching machine sequentially comprises an etching device (20), a gathering device (10) and an air draft device (30) in the gas flowing direction. The gathering device (10) comprises a magnetic filtering unit (6) arranged in a casing (5). Channels (7) are formed between the magnetic filtering unit (6) and the casing (5), and/ or in the magnetic filtering unit (6). The magnetic filtering unit (6) can adsorb magnetic particles in the gas flowing through the channels (7) to prevent the magnetic particles from being deposited in the air draft device (30). Therefore, the air draft efficiency and the service life of the air draft device (30) are increased.
Inventors:
XIAO WENHUAN (CN)
Application Number:
PCT/CN2015/070634
Publication Date:
July 07, 2016
Filing Date:
January 13, 2015
Export Citation:
Assignee:
SHENZHEN CHINA STAR OPTOELECT (CN)
International Classes:
C23F1/08; B03C1/02
Foreign References:
| US6315819B1 | 2001-11-13 | |||
| CN101296745A | 2008-10-29 | |||
| CN103556152A | 2014-02-05 | |||
| CN101297063A | 2008-10-29 | |||
| JP2004160312A | 2004-06-10 | |||
| JP2002153726A | 2002-05-28 |
Attorney, Agent or Firm:
YUHONG INTELLECTUAL PROPERTY LAW FIRM (CN)
北京聿宏知识产权代理有限公司 (CN)
北京聿宏知识产权代理有限公司 (CN)
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