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Title:
DRY ETHCING AGENT
Document Type and Number:
WIPO Patent Application WO/2013/015033
Kind Code:
A1
Abstract:
[Problem] To provide a dry etching agent having little effect on the global environment but having the required performance. [Solution] Provided is a dry etching agent comprising, each at a specific vol%, (A) a fluorine-containing unsaturated hydrocarbon represented by the formula CaFbHc (where a, b and c are each positive integers and satisfy the correlation of 2 < a < 5, c < b > 1, 2a + 2 > b + c, b < a + c, excluding the case where a = 3, b = 4, or c = 2), (B) at least one gas selected from the group consisting of O2, O3, CO, CO2, COCl2, COF2, F2, NF3, Cl2, Br2, I2, and YFn (where Y is Cl, Br or I and n is an integer between 1 and 5), and (C) at least one gas selected from the group consisting of N2, He, Ar, Ne, Xe, and Kr.

Inventors:
KIKUCHI AKIOU
UMEZAKI TOMONORI
HIBINO YASUO
MORI ISAMU
OKAMOTO SATORU
Application Number:
PCT/JP2012/065074
Publication Date:
January 31, 2013
Filing Date:
June 13, 2012
Export Citation:
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Assignee:
CENTRAL GLASS CO LTD (JP)
KIKUCHI AKIOU
UMEZAKI TOMONORI
HIBINO YASUO
MORI ISAMU
OKAMOTO SATORU
International Classes:
H01L21/3065
Foreign References:
JP2008300616A2008-12-11
JP2009206394A2009-09-10
JP2009206444A2009-09-10
JP2004536448A2004-12-02
JPH10140151A1998-05-26
JPH04346427A1992-12-02
JPH10223614A1998-08-21
JPH09191002A1997-07-22
JP2002530863A2002-09-17
JP2007537602A2007-12-20
JP2006193437A2006-07-27
JP2009091301A2009-04-30
Other References:
See also references of EP 2733725A4
J. APPL. PHYS., vol. 42, 2003, pages 5759 - 5764
Attorney, Agent or Firm:
KOBAYASHI, Hiromichi et al. (JP)
Hiromichi Kobayashi (JP)
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Claims: