Title:
DRY FILM PHOTORESIST
Document Type and Number:
WIPO Patent Application WO/2011/037438
Kind Code:
A2
Abstract:
The present invention relates to a dry film photoresist. In detail, the dry film photoresist according to the present invention enables a process of exposure to light to be performed when a base film is removed, and prevents the adverse effects of exposure to light caused by a base film, to thereby improve resolution. Further, the dry film photoresist of the present invention is advantageous in that transparency may not be deteriorated by a resin protection layer or a developing velocity may not be lowered by the resin protection layer even when a process of exposure to light is performed in the presence of the resin protection layer, thus achieving a high resolution.
Inventors:
SUK SANG HOON (KR)
MOON HEE WAN (KR)
BONG DONG HUN (KR)
LEE BYEONG IL (KR)
HAN KOOK HYUN (KR)
JHO SEUNG JE (KR)
CHOI JONG OOK (KR)
MOON HEE WAN (KR)
BONG DONG HUN (KR)
LEE BYEONG IL (KR)
HAN KOOK HYUN (KR)
JHO SEUNG JE (KR)
CHOI JONG OOK (KR)
Application Number:
PCT/KR2010/006592
Publication Date:
March 31, 2011
Filing Date:
September 28, 2010
Export Citation:
Assignee:
KOLON INC (KR)
SUK SANG HOON (KR)
MOON HEE WAN (KR)
BONG DONG HUN (KR)
LEE BYEONG IL (KR)
HAN KOOK HYUN (KR)
JHO SEUNG JE (KR)
CHOI JONG OOK (KR)
SUK SANG HOON (KR)
MOON HEE WAN (KR)
BONG DONG HUN (KR)
LEE BYEONG IL (KR)
HAN KOOK HYUN (KR)
JHO SEUNG JE (KR)
CHOI JONG OOK (KR)
International Classes:
G03F7/11; G03F7/075; G03F7/09
Foreign References:
| KR20080003948A | 2008-01-09 | |||
| US20030180635A1 | 2003-09-25 | |||
| US20040023166A1 | 2004-02-05 | |||
| KR20050056159A | 2005-06-14 |
Attorney, Agent or Firm:
MYUNG MOON IP & LAW FIRM (KR)
특허법인 명문 (KR)
특허법인 명문 (KR)
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